SCHEMBL1262771

SCHEMBL1262771

C=Cc1cccc[n+]1C.COS(=O)(=O)[O-]

nearest known ligand 0.68

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE known ✓ P22303 2/20 0.41
CHRM1 known ✓ P11229 1/20 0.35
CHRM3 known ✓ P20309 1/20 0.35
HDAC8 Q9BY41 1/20 0.68
TSHR P16473 1/20 0.41
HRH1 P35367 1/20 0.41
PDE4D Q08499 1/20 0.41
KDM4E B2RXH2 2/20 0.41
ALDH1A1 P00352 1/20 0.41
MAPT P10636 1/20 0.41
CTDSP1 Q9GZU7 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.40
RAB9A P51151 3/20 0.38
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
PABPC1 P11940 2/20 0.37
NPSR1 Q6W5P4 1/20 0.36
APOBEC3A P31941 1/20 0.36
APOBEC3G Q9HC16 1/20 0.36
RAD52 P43351 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Sulfuric Acid SCHEMBL11856466 0.90 HDAC8 (0.78) HDAC8ACHETSHRHRH1PDE4D
Sulfuric Acid SCHEMBL30240018 0.90 HDAC8 (0.78) HDAC8ACHETSHRHRH1PDE4D
Sulfuric Acid SCHEMBL30071023 0.87 HDAC8 (0.72) HDAC8ACHETSHRHRH1PDE4D
SCHEMBL5200858 0.85 HDAC8 (0.46) HDAC8ACHETSHRHRH1PDE4D
SCHEMBL11773830 0.83 HDAC8 (0.66) HDAC8ACHETSHRHRH1PDE4D
Trifluoromethanesulfonic Acid SCHEMBL218439 0.83 HDAC8 (0.66) HDAC8ACHETSHRHRH1PDE4D
SCHEMBL589251 0.82
SCHEMBL29961324 0.82
Water SCHEMBL9445012 0.80 HDAC8 (0.95) HDAC8ACHETSHRHRH1PDE4D
Fluoride Ion SCHEMBL7937290 0.80 HDAC8 (0.95) HDAC8ACHETSHRHRH1PDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113099-B2 High pressure high temperature (HPHT) aqueous drilling mud composition and process for preparing the same ISP INVESTMENTS LLC (US) 2018-10-30 US claimed
US-20150368538-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2015-12-24 US claimed
WO-2014133824-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2014-09-04 WO claimed
EP-0397474-A2 Photosensitive composition KABUSHIKI KAISHA TOSHIBA (JP) 1990-11-14 EP claimed
EP-0119713-B1 LIQUID ELECTROGRAPHIC DEVELOPERS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-10-07 EP claimed
US-4547449-A IMPROVED REPLENISHABILITY EASTMAN KODAK COMPANY (US) 1985-10-15 US claimed
EP-0119713-A1 Liquid electrographic developers EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-09-26 EP claimed
US-10113099-B2 High pressure high temperature (HPHT) aqueous drilling mud composition and process for preparing the same ISP INVESTMENTS LLC (US) 2018-10-30 US disclosed
US-20150368538-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2015-12-24 US disclosed
EP-2291422-B1 PIGMENT DISPERSANTS WITH MODIFIED COPOLYMERS BASF SE (DE) 2015-10-21 EP disclosed
WO-2014133824-A1 A NOVEL HIGH PRESSURE HIGH TEMPERATURE (HPHT) AQUEOUS DRILLING MUD COMPOSITION AND PROCESS FOR PREPARING THE SAME ISP INVESTMENTS INC. (US) 2014-09-04 WO disclosed
US-8664324-B2 Pigment dispersants with modified copolymers BASF SE (DE) 2014-03-04 US disclosed
US-20110144260-A1 PIGMENT DISPERSANTS WITH MODIFIED COPOLYMERS BASF SE (DE) 2011-06-16 US disclosed
EP-0119713-B1 LIQUID ELECTROGRAPHIC DEVELOPERS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-10-07 EP disclosed
US-4547449-A IMPROVED REPLENISHABILITY EASTMAN KODAK COMPANY (US) 1985-10-15 US disclosed
EP-0119713-A1 Liquid electrographic developers EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-09-26 EP disclosed
US-4283517-A BY HEATING IMMEDIATELY PRIOR TO DEPOSITING ON A BELT MILCHEM INCORPORATED (US) 1981-08-11 US disclosed
US-4273849-A HALOGENATED POLYMER, ACRYLIC COPOLYMER EASTMAN KODAK COMPANY (US) 1981-06-16 US disclosed
US-4229513-A CHLORINATED POLYETHYLENE, AND COPOLYMER OF POLAR MONOMER AND SOLUBILIZING MONOMER EASTMAN KODAK COMPANY (US) 1980-10-21 US disclosed
US-4001151-A DENTURE ADHESIVES, POLYETHYLENE, POLYPROPYLENE WARNER-LAMBERT COMPANY (US) 1977-01-04 US disclosed