SCHEMBL12641406

SCHEMBL12641406

NCCc1ccc(C=O)c(N=O)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TAAR1 Q96RJ0 7/20 0.39
▸ KDM4E B2RXH2 3/20 0.39
▸ ADRA2A P08913 2/20 0.39
▸ MAPT P10636 2/20 0.39
▸ DRD2 P14416 2/20 0.39
▸ DRD1 P21728 2/20 0.39
▸ DRD4 P21917 2/20 0.39
▸ DRD5 P21918 2/20 0.39
▸ SLC6A2 P23975 2/20 0.39
▸ MAPK1 P28482 2/20 0.39
▸ DRD3 P35462 2/20 0.39
▸ RECQL P46063 2/20 0.39
▸ SLC6A3 Q01959 2/20 0.39
▸ TDP1 Q9NUW8 2/20 0.39
▸ TP53 P04637 2/20 0.39
▸ CYP2D6 P10635 2/20 0.39
▸ PNMT P11086 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ ADRB2 P07550 1/20 0.39
▸ HTR1A P08908 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21252818 0.80 TAAR1 (0.45) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL24211257 0.80 CDK1 (0.47) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL13062022 0.78 CDK1 (0.47) CDK1
SCHEMBL13917357 0.77 TAAR1 (0.47) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL16404803 0.77 TAAR1 (0.42) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL15236193 0.76 TDP1 (0.33) KDM4EADRA2AMAPTDRD1SLC6A2
SCHEMBL15314019 0.75 TAAR1 (0.60) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL13638853 0.75 ERN1 (0.43) KDM4EMAPTTDP1TP53ALDH1A1
SCHEMBL25122207 0.71 TAAR1 (0.60) TAAR1KDM4EADRA2AMAPTDRD2
SCHEMBL24211238 0.71 CDK1 (0.71) TAAR1KDM4EADRA2AMAPTDRD2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964623-B2 Tricyclic benzopyrane compound NISSAN CHEMICAL INDUSTRIES LTD. (JP) 2011-06-21 — — US disclosed
US-7652008-B2 2,2,7,9-tetramethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-3-ol; 3-hydroxy-2,2,9-trimethyl-4-[(2-phenylethyl)amino]-3,4-dihydro-2H-pyrano[2,3-g]quinolin-7-carbonitrile; have the prolongation effect on refractory period NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-26 — — US disclosed
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