SCHEMBL12646337

SCHEMBL12646337

CC(C)Oc1ccc2cc(C(=O)C(C)(C)C)ccc2c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.51
PARP10 Q53GL7 1/20 0.50
KDM4E B2RXH2 3/20 0.45
F2 P00734 2/20 0.45
PLG P00747 2/20 0.45
PLAU P00749 2/20 0.45
PLAT P00750 2/20 0.45
KLKB1 P03952 2/20 0.45
PRSS1 P07477 2/20 0.45
ALDH1A1 P00352 2/20 0.45
NR1H4 Q96RI1 1/20 0.43
RXRA P19793 1/20 0.42
RXRB P28702 1/20 0.42
BRD4 O60885 1/20 0.41
BRPF1 P55201 1/20 0.41
GABBR2 O75899 1/20 0.41
GABBR1 Q9UBS5 1/20 0.41
ABL1 P00519 1/20 0.41
POLB P06746 1/20 0.40
MAPT P10636 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12532571 0.86 KMT2A (0.63) KMT2APARP10KDM4EALDH1A1NR1H4
SCHEMBL16722810 0.84 CES2 (0.46) KMT2AKDM4EPLAUALDH1A1GABBR2
SCHEMBL4137247 0.83 KDM4E (0.66) KMT2AKDM4EPLAUALDH1A1GABBR2
SCHEMBL22548942 0.81 KMT2A (0.58) KMT2APARP10KDM4EALDH1A1NR1H4
SCHEMBL22548977 0.81 KMT2A (0.58) KMT2APARP10KDM4EALDH1A1NR1H4
SCHEMBL12940516 0.81 KDM4E (0.46) KDM4EPLAUALDH1A1GABBR2GABBR1
SCHEMBL15763862 0.81 KMT2A (0.56) KMT2APARP10KDM4EF2PLG
SCHEMBL4153130 0.80 KDM4E (0.62) KMT2AKDM4EPLAUALDH1A1GABBR2
SCHEMBL22182886 0.79 KMT2A (0.55) KMT2APARP10KDM4EF2PLG
SCHEMBL20507042 0.78 ELANE (0.50) KMT2AKDM4EALDH1A1POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2335920-A1 IMPACT-RESISTANT MOLDED LAMINATE, PROCESS FOR PRODUCING SAME, AND IMPACT-RESISTANT MATERIAL Kuraray Co., Ltd. (JP) 2011-06-22 EP disclosed