⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22028070 | 1.00 | ALDH1A1 (0.53) | — | |
| SCHEMBL7156239 | 1.00 | — | — | |
| SCHEMBL1269077 | 1.00 | — | — | |
| SCHEMBL11123615 | 0.96 | ALDH1A1 (0.56) | — | |
| SCHEMBL65570 | 0.96 | — | — | |
| SCHEMBL7827565 | 0.96 | — | — | |
| SCHEMBL65569 | 0.96 | — | — | |
| SCHEMBL11123616 | 0.96 | ALDH1A1 (0.56) | — | |
| SCHEMBL160417 | 0.96 | — | — | |
| SCHEMBL31241402 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117844439-A | Single-component silicone sealant and preparation method thereof | 广州白云科技股份有限公司 | 2024-04-09 | — | — | CN | claimed |
| CN-114436517-B | Processing technology of glass panel | 东莞市柏维光学科技有限公司 | 2024-03-26 | — | — | CN | claimed |
| CN-117165255-A | Ageing-resistant sealant for hollow glass | 河北新津康塑胶制品制造有限公司 | 2023-12-05 | — | — | CN | claimed |
| CN-115768826-A | Method for preparing coating composition for protecting oilfield operational components | S+S工业技术有限责任公司 | 2023-03-07 | — | — | CN | claimed |
| CN-113185947-B | Mixed crosslinking system two-component hollow sealant | 广州市高士实业有限公司 | 2022-11-11 | — | — | CN | claimed |
| CN-112271296-B | Porous conductive soft suspension silicon cathode and preparation method thereof | 西安工程大学 | 2022-09-09 | — | — | CN | claimed |
| CN-114436517-A | Processing technology of glass panel | 东莞市柏维光学科技有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-112619204-B | Deep dehydration drying agent and application thereof in synthesis of methyl tributyl ketoxime silane | 浙江锦华新材料股份有限公司 | 2022-04-08 | — | — | CN | claimed |
| CN-108530633-B | Preparation method of organic silicon polymer | 东莞兆舜有机硅科技股份有限公司 | 2021-11-16 | — | — | CN | claimed |
| CN-113185947-A | Mixed crosslinking system two-component hollow sealant | 广州市高士实业有限公司 | 2021-07-30 | — | — | CN | claimed |
| CN-112619204-A | Deep dehydration drying agent and application thereof in synthesis of methyl tributyl ketoxime silane | 浙江锦华新材料股份有限公司 | 2021-04-09 | — | — | CN | claimed |
| CN-106833506-B | Methyl silicone oil-resistant single-component room temperature curing sealant | 东莞优邦材料科技股份有限公司 | 2020-04-03 | — | — | CN | claimed |
| CN-108291132-A | Etching composition and method for manufacturing semiconductor device using the same | 秀博瑞殷株式公社 | 2018-07-17 | — | — | CN | claimed |
| CN-108231573-A | Etching composition and method for manufacturing semiconductor device by using the same | 三星电子株式会社 | 2018-06-29 | — | — | CN | claimed |
| CN-104395405-B | Moisture-curing organopolysiloxane composition | 莫门蒂夫性能材料股份有限公司 | 2017-04-26 | — | — | CN | claimed |
| CN-104114598-B | Moisture-curing organopolysiloxane composition | 莫门蒂夫性能材料股份有限公司 | 2017-03-01 | — | — | CN | claimed |
| CN-106147693-A | A and ketoxime type single-component room temperature vulcanized silicone rubber | 刘方旭 | 2016-11-23 | — | — | CN | claimed |
| US-11987727-B2 | Inorganic filler dispersion, superhydrophobic insulating and wear-resistant coating and preparation method thereof | TIANJIN DALV ELECTRIC POWER TECHNOLOGY CO., LTD. (CN) | 2024-05-21 | — | — | US | disclosed |
| CN-100369995-C | Curing composition for organosilicon compound and silicone-based coating agent composition | SHINETSU CHEMICAL CO (JP) | 2008-02-20 | — | — | CN | disclosed |
| CN-1637098-A | Curing composition for organosilicon compound and silicone-based coating agent composition | SHINETSU CHEMICAL CO (JP) | 2005-07-13 | — | — | CN | disclosed |