Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.55 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.45 |
| ▸ | CASP3 | P42574 | 1/20 | 0.41 |
| ▸ | MDM4 | O15151 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | CXCR2 | P25025 | 1/20 | 0.39 |
| ▸ | FABP7 | O15540 | 1/20 | 0.39 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.39 |
| ▸ | TLR2 | O60603 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15434583 | 0.86 | KMT2A (0.53) | KMT2AEPHX2CASP3TLR2 | |
| SCHEMBL15315503 | 0.85 | KMT2A (0.48) | KMT2AEPHX2CASP3MDM4TP53 | |
| SCHEMBL18735509 | 0.84 | KMT2A (0.54) | KMT2AEPHX2TLR2 | |
| SCHEMBL15434625 | 0.84 | KMT2A (0.55) | KMT2AEPHX2CASP3MDM4TP53 | |
| SCHEMBL15434586 | 0.84 | KMT2A (0.49) | KMT2AEPHX2CASP3MDM4TP53 | |
| SCHEMBL12665923 | 0.83 | KMT2A (0.62) | KMT2AEPHX2CASP3FABP7FABP5 | |
| SCHEMBL19574725 | 0.82 | KMT2A (0.50) | KMT2AEPHX2CASP3TLR2 | |
| SCHEMBL27820247 | 0.82 | KMT2A (0.60) | KMT2AEPHX2CASP3TLR2 | |
| SCHEMBL15434639 | 0.81 | KMT2A (0.50) | KMT2AEPHX2CASP3MDM4TP53 | |
| SCHEMBL14116288 | 0.81 | KMT2A (0.63) | KMT2AEPHX2CASP3FABP7FABP5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8741546-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-20130209936-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-8507175-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8426115-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-23 | — | — | US | disclosed |
| US-20110091812-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110033803-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-10 | — | — | US | disclosed |