Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8498498 | 0.86 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL11023475 | 0.80 | — | — | |
| SCHEMBL31142120 | 0.80 | — | — | |
| SCHEMBL5835639 | 0.72 | — | — | |
| SCHEMBL31316946 | 0.68 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL15283779 | 0.68 | — | — | |
| SCHEMBL787974 | 0.68 | — | — | |
| SCHEMBL8499761 | 0.68 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL15284208 | 0.68 | — | — | |
| SCHEMBL8826752 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6716770-B2 | Vapor deposition using organosilicon compound and fluorohydrocarbon plasma; dielectric | AIR PRODUCTS AND CHEMICALS, INC. | 2004-04-06 | — | — | US | claimed |
| US-20030049460-A1 | Low dielectric constant material and method of processing by CVD | AIR PRODUCTS AND CHEMICALS, INC. | 2003-03-13 | — | — | US | claimed |
| EP-1260606-A2 | Low dielectric constant material and method of processing by cvd | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2002-11-27 | — | — | EP | claimed |
| US-5498739-A | Method for introducing hydrocarbons into chlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-03-12 | — | — | US | claimed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11773290-B2 | Method for applying high performance silicon-based coating compositions | BURNING BUSH GROUP, LLC (US) | 2023-10-03 | — | — | US | disclosed |
| US-20230253626-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTIC SOLUTION SECONDARY BATTERY USING SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-08-10 | — | — | US | disclosed |
| US-11688881-B2 | Nonaqueous electrolytic solution and nonaqueous electrolytic solution secondary battery using same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-06-27 | — | — | US | disclosed |
| CN-115287069-B | C-free etching solution for inhibiting silicon dioxide etching | 湖北兴福电子材料股份有限公司 | 2023-06-09 | — | — | CN | disclosed |
| CN-115287069-A | C-free etching solution for inhibiting silicon dioxide etching | 湖北兴福电子材料有限公司 | 2022-11-04 | — | — | CN | disclosed |
| EP-3231892-B1 | MECHANICAL ENHANCEMENT OF DENSE AND POROUS ORGANOSILICATE MATERIALS BY UV EXPOSURE | VERSUM MAT US LLC (US) | 2020-08-05 | — | — | EP | disclosed |
| US-20180223045-A1 | POLYIMIDE PRECURSOR COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-08-09 | — | — | US | disclosed |
| EP-0659754-B1 | Method for introducing hydrocarbons into chlorosilanes | SHINETSU CHEMICAL CO (JP) | 1999-11-17 | — | — | EP | disclosed |
| EP-0774533-A1 | Method for depositing Si-O containing coatings | DOW CORNING CORPORATION (US) | 1997-05-21 | — | — | EP | disclosed |
| EP-0771886-A1 | Method for depositing amorphous SiNC coatings | DOW CORNING CORPORATION (US) | 1997-05-07 | — | — | EP | disclosed |
| US-5498739-A | Method for introducing hydrocarbons into chlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-03-12 | — | — | US | disclosed |
| EP-0659754-A1 | Method for introducing hydrocarbons into chlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5068381-A | Reaction of silane with acetylene compound for use as a crosslinking agent and as a photosensitive agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1991-11-26 | — | — | US | disclosed |
| US-4588801-A | Polysilane positive photoresist materials and methods for their use | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1986-05-13 | — | — | US | disclosed |
| US-4587205-A | Method of using polysilane positive photoresist materials | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1986-05-06 | — | — | US | disclosed |