⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12898554 | 0.77 | — | — | |
| SCHEMBL5413083 | 0.75 | — | — | |
| SCHEMBL3966887 | 0.75 | — | — | |
| SCHEMBL5410757 | 0.75 | — | — | |
| SCHEMBL5412439 | 0.73 | — | — | |
| SCHEMBL13089277 | 0.73 | — | — | |
| SCHEMBL8019350 | 0.72 | — | — | |
| SCHEMBL5420168 | 0.71 | — | — | |
| SCHEMBL12898454 | 0.69 | — | — | |
| SCHEMBL401132 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8481423-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-09 | — | — | US | disclosed |
| US-8470706-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-25 | — | — | US | disclosed |
| US-20120329269-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-27 | — | — | US | disclosed |
| US-20110042789-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM | JSR CORPORATION (JP) | 2011-02-24 | — | — | US | disclosed |
| EP-2264219-A1 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND PROCESS FOR PRODUCTION THEREOF | JSR Corporation (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-20100261925-A1 | METHOD FOR PRODUCING SILICON COMPOUND | JSR CORPORATION (JP) | 2010-10-14 | — | — | US | disclosed |
| US-20090075472-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | disclosed |