⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5933501 | 0.81 | — | — | |
| SCHEMBL1877496 | 0.81 | — | — | |
| SCHEMBL225234 | 0.81 | — | — | |
| SCHEMBL9336562 | 0.81 | — | — | |
| SCHEMBL12119866 | 0.81 | — | — | |
| SCHEMBL24349049 | 0.81 | — | — | |
| SCHEMBL13770688 | 0.81 | — | — | |
| SCHEMBL2798535 | 0.81 | — | — | |
| SCHEMBL5932430 | 0.81 | — | — | |
| SCHEMBL28854519 | 0.81 | THRB (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 139 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10577245-B2 | Method for purifying phosphoric acid | LXP GROUP GMBH (DE) | 2020-03-03 | — | — | US | claimed |
| CN-106103341-B | Process for purifying phosphoric acid | LXP集团有限公司 | 2019-07-02 | — | — | CN | claimed |
| CN-109929328-A | A kind of compound ink and preparation method thereof, device | TCL集团股份有限公司 | 2019-06-25 | — | — | CN | claimed |
| EP-2924003-B1 | Method for purifying phosphoric acid | LXP GROUP GMBH (DE) | 2019-05-08 | — | — | EP | claimed |
| US-20170081189-A1 | METHOD FOR PURIFYING PHOSPHORIC ACID | LXP GROUP GMBH (DE) | 2017-03-23 | — | — | US | claimed |
| CN-106103341-A | Process for purifying phosphoric acid | LXP集团有限公司 | 2016-11-09 | — | — | CN | claimed |
| EP-2924003-A1 | Method for purifying phosphoric acid | Maxbiogas GmbH (DE) | 2015-09-30 | — | — | EP | claimed |
| WO-2023239152-A1 | THIN FILM PRECURSOR COMPOUND, METHOD FOR FORMING THIN FILM BY USING SAME, AND SEMICONDUCTOR SUBSTRATE MANUFACTURED THEREBY | 솔브레인 주식회사 | 2023-12-14 | — | — | WO | disclosed |
| EP-3576845-B1 | TOPCOAT FOR PERMANENT LIP MAKE UP | OREAL (FR) | 2023-06-07 | — | — | EP | disclosed |
| WO-2022094770-A1 | ELECTROLYTE, ELECTROCHEMICAL DEVICE, AND ELECTRONIC DEVICE | 宁德新能源科技有限公司 | 2022-05-12 | — | — | WO | disclosed |
| WO-2021065450-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |
| CN-111763448-A | Powder coating material, coated article and note board | 富士施乐株式会社 | 2020-10-13 | — | — | CN | disclosed |
| WO-2020195588-A1 | ACTINIC-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERNING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | 富士フイルム株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-4657947-A | COVERING RUSTY METAL SURFACES | ASAHI DENKA KOGYO K.K. (JP) | 1987-04-14 | — | — | US | disclosed |
| EP-0197458-A2 | Curable epoxy resin composition | ASAHI DENKA KOGYO KABUSHIKI KAISHA (JP) | 1986-10-15 | — | — | EP | disclosed |
| US-4535103-A | POLYEPOXIDES AND EPOXY RESINS CROSSLINKED AND HARDENED WITH PHOSPHOROUS COMPOUNDS, AMINES, AND DIISOCYANATES | ASAHI DENKA KOGYO K.K. (JP) | 1985-08-13 | — | — | US | disclosed |
| US-4530947-A | A RUSTY METAL-ADHERING CURABLE MIXTURE OF EPOXIDE-POLYHYDROXIDE REACTION PRODUCT, POLYISOCYANATE AND BITUMINOUS MATERIAL | ASAHI DENKA KOGYO K.K. (JP) | 1985-07-23 | — | — | US | disclosed |
| US-4340716-A | EPOXY RESINS AND HARDENERS | ASAHI DENKA KOGYO K.K. (JP) | 1982-07-20 | — | — | US | disclosed |
| US-4113691-A | PHENYLENE ETHER POLYMER | UNION CARBIDE CORPORATION (US) | 1978-09-12 | — | — | US | disclosed |
| US-3950451-A | COUPLED PRODUCT OF ALKYLPHENOL AND PHENOL-FORMALDEHYDE-DIAMINE CONDENSATE | ASAHI DENKA KOGYO K.K. (JA) | 1976-04-13 | — | — | US | disclosed |