SCHEMBL12760874

SCHEMBL12760874

Oc1ccccc1OC1(Cl)CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.41
CA2 P00918 2/20 0.41
CA1 P00915 2/20 0.41
TP53 P04637 1/20 0.41
GAA P10253 7/20 0.38
MAPT P10636 4/20 0.38
LMNA P02545 2/20 0.38
JAK2 O60674 1/20 0.38
HPGD P15428 6/20 0.33
ALDH1A1 P00352 5/20 0.33
HSD17B10 Q99714 4/20 0.33
POLB P06746 3/20 0.33
KDM4E B2RXH2 3/20 0.33
KMT2A Q03164 2/20 0.33
ALOX15 P16050 2/20 0.33
MAPK1 P28482 1/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
MEN1 O00255 1/20 0.33
NPC1 O15118 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1839819 0.78 TP53 (0.45) TSHRCA2CA1TP53GAA
SCHEMBL12760773 0.78 CA2 (0.41) TSHRCA2CA1TP53GAA
SCHEMBL1836784 0.76 TP53 (0.47) TSHRCA2CA1TP53GAA
SCHEMBL1838322 0.74 CA1 (0.41) TSHRCA2CA1TP53GAA
SCHEMBL5171385 0.74 SMN1; SMN2 (0.43) TSHRCA2CA1TP53GAA
SCHEMBL12760744 0.73 ESR1 (0.36) TSHRCA2CA1TP53GAA
SCHEMBL689527 0.71 GAA (0.41) TSHRCA2CA1TP53GAA
SCHEMBL12760852 0.71 TP53 (0.42) TSHRCA2CA1TP53GAA
SCHEMBL1839605 0.71 TP53 (0.42) TSHRCA2CA1TP53GAA
SCHEMBL1839709 0.71 CA1 (0.39) TSHRCA2CA1TP53GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2505576-B1 CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL CO (JP) 2019-04-24 EP disclosed
US-8969629-B2 Cyclic compound, production process thereof, radiation-sensitive composition and resist pattern formation method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-03-03 US disclosed
US-20120282546-A1 CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-11-08 US disclosed
EP-2505576-A1 CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2012-10-03 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120282546-A1 CYCLIC COMPOUND, PRODUCTION PROCESS THEREOF, RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD CROCC, XRCC6, CHEK1 TSHR 3582/4885CA2 4317/4885CA1 1677/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.