SCHEMBL12782828

SCHEMBL12782828

C=CC(=O)NC1(C2CCCC2)C2CC3CC(C2)CC1C3

nearest known ligand 0.38

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 2/20 0.32
EPHX2 P34913 1/20 0.32
TGM2 P21980 1/20 0.31
HSD11B1 P28845 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12782832 0.98 EPHX1 (0.34) EPHX1EPHX2TGM2HSD11B1
SCHEMBL12782852 0.86
SCHEMBL12782842 0.85
SCHEMBL12782855 0.84
SCHEMBL12782942 0.83 TGM2 (0.39) EPHX1EPHX2TGM2
SCHEMBL12782865 0.82 EPHX2 (0.34) EPHX1EPHX2TGM2
SCHEMBL12782869 0.81 EPHX2 (0.36) EPHX1EPHX2
SCHEMBL12782841 0.79
SCHEMBL12782845 0.77 POLB (0.30)
SCHEMBL12782858 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed