Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FFAR3 | O14843 | 1/20 | 0.50 |
| ▸ | LCK | P06239 | 1/20 | 0.50 |
| ▸ | FYN | P06241 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | THPO | P40225 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL7858832 | 0.97 | FFAR3 (0.47) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL7849408 | 0.96 | FFAR3 (0.54) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL30830 | 0.96 | FFAR3 (0.54) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL3925485 | 0.96 | FFAR3 (0.54) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL8437478 | 0.96 | — | — | |
| Acetic Acid SCHEMBL23358714 | 0.93 | FFAR3 (0.50) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL9183783 | 0.93 | FFAR3 (0.50) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL11309514 | 0.93 | FFAR3 (0.50) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL11653075 | 0.93 | FFAR3 (0.50) | FFAR3LCKFYNTDP1LMNA | |
| Acetic Acid SCHEMBL1527600 | 0.93 | FFAR3 (0.50) | FFAR3LCKFYNTDP1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 155 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119753724-A | Preparation method and application of carbon-based metal monoatomic catalyst | 广州番禺职业技术学院 | 2025-04-04 | — | — | CN | claimed |
| US-20240065962-A1 | COSMETIC PREPARATION | SHISEIDO COMPANY, LTD. (JP) | 2024-02-29 | — | — | US | claimed |
| EP-4292582-A1 | COSMETIC PREPARATION | Shiseido Company, Ltd. (JP) | 2023-12-20 | — | — | EP | claimed |
| WO-2022172790-A1 | COSMETIC PREPARATION | 株式会社 資生堂 | 2022-08-18 | — | — | WO | claimed |
| CN-111379545-A | Deep conglomerate heavy oil reservoir blockage removing and injection increasing method | 中国石油天然气集团有限公司 | 2020-07-07 | — | — | CN | claimed |
| US-12584083-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4693374-A1 | METHOD FOR PRODUCING POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4693373-A1 | POLISHING AND WASHING METHOD, WASHING AGENT, AND SET OF POLISHING COMPOSITION AND WASHING AGENT | Fujimi Incorporated (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4682939-A1 | POLISHING COMPOSITION, CONCENTRATED LIQUID OF POLISHING COMPOSITION, AND POLISHING METHOD | Fujimi Incorporated (JP) | 2026-01-21 | — | — | EP | disclosed |
| US-12516276-B2 | Surface treatment composition | FUJIMI INCORPORATED (JP) | 2026-01-06 | — | — | US | disclosed |
| US-12404445-B1 | Compositions and methods for increasing permeability in hydrocarbon shale formations | TRUOX, INC. (US) | 2025-09-02 | — | — | US | disclosed |
| US-12404475-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2025-09-02 | — | — | US | disclosed |
| EP-0790856-A1 | PROCESS FOR TREATING H 2?S CONTAINING GAS STREAMS | THE DOW CHEMICAL COMPANY (US) | 1997-08-27 | — | — | EP | disclosed |
| WO-1996014921-A9 | PROCESS FOR TREATING H2S CONTAINING GAS STREAMS | — | 1996-08-08 | — | — | WO | disclosed |
| US-5543122-A | Process for the removal of h2 S from non-condensible gas streams and from steam | THE DOW CHEMICAL COMPANY (US) | 1996-08-06 | — | — | US | disclosed |
| WO-1996014921-A1 | PROCESS FOR TREATING H2S CONTAINING GAS STREAMS | THE DOW CHEMICAL COMPANY (US) | 1996-05-23 | — | — | WO | disclosed |
| US-4859575-A | Method for processing of silver halide color photographic material with dialysis treatment | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1989-08-22 | — | — | US | disclosed |
| US-4618569-A | USING ION EXCHANGE RESIN AND LIQUID STABILIZER | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1986-10-21 | — | — | US | disclosed |
| US-4514367-A | USING ION EXCHANGE FIBER CONTAINING SULFONIC GROUP | AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY (JP) | 1985-04-30 | — | — | US | disclosed |
| US-3709825-A | CLEANING COMPOSITION | COLGATE PALMOLIVE CO | 1973-01-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12584083-B2 | Surface treatment composition, surface treatment method, and method for producing semiconductor substrate | PIEZO1, TYRO3, ACP1 | FFAR3 2848/4885LCK 900/4885FYN 10/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.