⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12853021 | 0.75 | — | — | |
| SCHEMBL3481574 | 0.71 | — | — | |
| SCHEMBL16154018 | 0.71 | — | — | |
| SCHEMBL21773391 | 0.69 | — | — | |
| SCHEMBL13142320 | 0.59 | — | — | |
| SCHEMBL7955599 | 0.47 | — | — | |
| SCHEMBL399794 | 0.47 | — | — | |
| SCHEMBL4898698 | 0.43 | — | — | |
| Ammonia Solution, Strong SCHEMBL15440386 | 0.43 | — | — | |
| SCHEMBL5727843 | 0.43 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12624248-B2 | Curable formulations for forming low-k dielectric silicon-containing films using polycarbosilazane | L'AIR LIQUIDE, SOCIETÉ ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCÉDÉS GEORGES CLAUDE (FR) | 2026-05-12 | — | — | US | claimed |
| WO-2025226985-A1 | PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES | VERSUM MATERIALS US, LLC (US) | 2025-10-30 | — | — | WO | claimed |
| US-20250270694-A1 | PROCESSING APPARATUS, PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2025-08-28 | — | — | US | claimed |
| US-12378666-B2 | Silicon carbide thin films and vapor deposition methods thereof | GELEST, INC. (US) | 2025-08-05 | — | — | US | claimed |
| US-12281386-B2 | Method of processing substrate for forming film containing silicon by supplying precursor containing Si—C bonds | Kokusai Electric Corporation (JP) | 2025-04-22 | — | — | US | claimed |
| US-20240304438-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2024-09-12 | — | — | US | claimed |
| US-20240271279-A1 | SILICON CARBIDE THIN FILMS AND VAPOR DEPOSITION METHODS THEREOF | GELEST, INC. | 2024-08-15 | — | — | US | claimed |
| EP-3620550-B1 | METHODS FOR MAKING SILICON CONTAINING FILMS THAT HAVE HIGH CARBON CONTENT | VERSUM MAT US LLC (US) | 2024-05-01 | — | — | EP | claimed |
| CN-115038741-B | Curable formulations for forming low k dielectric silicon-containing films using polycarbosilazanes | 乔治洛德方法研究和开发液化空气有限公司 | 2024-04-02 | — | — | CN | claimed |
| US-20230377874-A1 | COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC | 2023-11-23 | — | — | US | claimed |
| US-20120122302-A1 | Apparatus And Methods For Deposition Of Silicon Carbide And Silicon Carbonitride Films | APPLIED MATERIALS, INC. (US) | 2012-05-17 | — | — | US | claimed |
| WO-2012061593-A2 | APPARATUS AND METHODS FOR DEPOSITION OF SILICON CARBIDE AND SILICON CARBONITRIDE FILMS | APPLIED MATERIALS, INC. (US) | 2012-05-10 | — | — | WO | claimed |
| US-20120088193-A1 | Radiation Patternable CVD Film | APPLIED MATERIALS, INC. (US) | 2012-04-12 | — | — | US | claimed |
| EP-1305823-A4 | PROCESS FOR GROWING A MAGNESIUM OXIDE FILM ON A SILICON (100) SUBSTRATE COATED WITH A CUBIC SILICON CARBIDE BUFFER LAYER | KOREA RES INST CHEM TECH (KR) | 2006-07-05 | — | — | EP | claimed |
| US-6800133-B1 | Process for growing a magnesium oxide film on a silicon (100) substrate coated with a cubic silicon carbide butter layer | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2004-10-05 | — | — | US | claimed |
| EP-1305823-A1 | PROCESS FOR GROWING A MAGNESIUM OXIDE FILM ON A SILICON (100) SUBSTRATE COATED WITH A CUBIC SILICON CARBIDE BUFFER LAYER | Korea Research Institute of Chemical Technology (KR) | 2003-05-02 | — | — | EP | claimed |
| WO-2002013246-A1 | PROCESS FOR GROWING A MAGNESIUM OXIDE FILM ON A SILICON (100) SUBSTRATE COATED WITH A CUBIC SILICON CARBIDE BUFFER LAYER | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2002-02-14 | — | — | WO | claimed |
| EP-0723600-B1 | PROCESS FOR THE PREPARATION OF SILICON CARBIDE FILMS USING SINGLE ORGANOSILICON COMPOUNDS | KOREA RES INST CHEM TECH (KR) | 1999-07-07 | — | — | EP | claimed |
| EP-0723600-A1 | PROCESS FOR THE PREPARATION OF SILICON CARBIDE FILMS USING SINGLE ORGANOSILICON COMPOUNDS | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 1996-07-31 | — | — | EP | claimed |
| WO-1995010638-A1 | PROCESS FOR THE PREPARATION OF SILICON CARBIDE FILMS USING SINGLE ORGANOSILICON COMPOUNDS | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 1995-04-20 | — | — | WO | claimed |