⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10583087 | 0.81 | — | — | |
| SCHEMBL6177602 | 0.76 | ALDH1A1 (0.36) | — | |
| SCHEMBL853956 | 0.75 | — | — | |
| SCHEMBL3317887 | 0.75 | — | — | |
| SCHEMBL9119245 | 0.75 | — | — | |
| SCHEMBL891914 | 0.75 | — | — | |
| SCHEMBL9119628 | 0.75 | — | — | |
| SCHEMBL891913 | 0.75 | — | — | |
| SCHEMBL8383024 | 0.75 | — | — | |
| SCHEMBL3316757 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2046 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113419404-B | Photoresist composition | 北京科华微电子材料有限公司 | 2023-04-18 | — | — | CN | claimed |
| CN-113419404-A | Photoresist composition | 北京科华微电子材料有限公司 | 2021-09-21 | — | — | CN | claimed |
| US-11033864-B2 | Porous membrane | MITSUBISHI CHEMICAL CORPORATION (JP) | 2021-06-15 | — | — | US | claimed |
| EP-3511003-B1 | CYCLIC AMINE DERIVATIVE AND PHARMACEUTICAL USE THEREOF | TORAY INDUSTRIES (JP) | 2021-03-03 | — | — | EP | claimed |
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | claimed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | claimed |
| CN-103324030-B | Positive photoresist composition and positive photoresist developing process | KEMPUR MICROELECTRONICS, INC. (CN) | 2015-09-09 | — | — | CN | claimed |
| CN-103324030-A | Positive photoresist composition and positive photoresist developing process | KEMPUR MICROELECTRONICS INC | 2013-09-25 | — | — | CN | claimed |
| US-8324257-B2 | Mitotic kinesin inhibitors and methods of use thereof | ARRAY BIOPHARMA INC. (US) | 2012-12-04 | — | — | US | claimed |
| EP-1776399-B1 | MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS | UNIV GENT (BE) | 2012-11-14 | — | — | EP | claimed |
| EP-1038864-A1 | NOVEL METALLOPROTEINASE INHIBITORS | FUJI YAKUHIN KOGYO KABUSHIKI KAISHA (JP) | 2000-09-27 | — | — | EP | claimed |
| US-6017676-A | Photoresist composition comprising a copolymer resin | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2000-01-25 | — | — | US | claimed |
| US-5856561-A | Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-05 | — | — | US | claimed |
| EP-0039060-B1 | A NEW METHOD FOR PREPARATION OF ANTHRACYCLINE DERIVATIVES | Zaidanhojin Biseibutsu Kagaku Kenkyukai (JP) | 1986-08-06 | — | — | EP | claimed |
| US-4508909-A | Synthesis of hydroxyethyltetrazolethiol and etherified intermediates therefor | SHIONOGI & CO., LTD. (JP) | 1985-04-02 | — | — | US | claimed |
| EP-0124618-A1 | CEPHALOSPORIN DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND AGENTS FOR PROPHYLAXIS OR TREATMENT OF BACTERIA-INDUCED DISEASES | Kyoto Pharmaceutical Industries, Ltd. (JP) | 1984-11-14 | — | — | EP | claimed |
| EP-0121875-A2 | Process for producing alkaline dischargeable dyeings and prints | BASF Aktiengesellschaft (DE) | 1984-10-17 | — | — | EP | claimed |
| US-4360664-A | ANTITUMOR AGENT, ANTIBIOTIC | ZAIDAN HOJIN BISEIBUTSU KAGAKU KENKYU KAI (JP) | 1982-11-23 | — | — | US | claimed |
| EP-0063359-A1 | 1,4-Dihydropyridine derivatives and processes for preparing the same | BANYU PHARMACEUTICAL CO., LTD. (JP) | 1982-10-27 | — | — | EP | claimed |
| EP-0039060-A1 | A new method for preparation of anthracycline derivatives | Zaidanhojin Biseibutsu Kagaku Kenkyukai (JP) | 1981-11-04 | — | — | EP | claimed |