⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL425307 | 0.88 | FDPS (0.44) | — | |
| Hydrochloric Acid SCHEMBL28697019 | 0.86 | FDPS (0.42) | — | |
| SCHEMBL2058302 | 0.84 | SPHK1 (0.37) | — | |
| Hydroxyamine SCHEMBL16774695 | 0.82 | TSHR (0.44) | — | |
| SCHEMBL16343266 | 0.82 | FDPS (0.37) | — | |
| SCHEMBL4921184 | 0.82 | TSHR (0.41) | — | |
| SCHEMBL65283 | 0.82 | — | — | |
| Dimethylamine SCHEMBL7551177 | 0.81 | FDPS (0.39) | — | |
| SCHEMBL20596841 | 0.81 | — | — | |
| SCHEMBL2057863 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107801401-B | Cleaning composition with ionic liquid | 约翰逊父子公司 | 2021-06-04 | — | — | CN | claimed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| CN-101398639-A | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-04-01 | — | — | CN | claimed |
| CN-107801401-B | Cleaning composition with ionic liquid | 约翰逊父子公司 | 2021-06-04 | — | — | CN | disclosed |
| WO-2014100695-A1 | PRMT5 INHIBITORS AND USES THEREOF | Epizyme, Inc. (US) | 2014-06-26 | — | — | WO | disclosed |
| EP-2450186-A1 | LAMINATE | Sumitomo Chemical Company, Limited (JP) | 2012-05-09 | — | — | EP | disclosed |
| US-20120100384-A1 | LAMINATE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-26 | — | — | US | disclosed |
| US-8163095-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-04-24 | — | — | US | disclosed |
| EP-2441799-A1 | AQUEOUS EMULSION | Sumitomo Chemical Company, Limited (JP) | 2012-04-18 | — | — | EP | disclosed |
| US-20120088111-A1 | AQUEOUS EMULSION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-04-12 | — | — | US | disclosed |
| US-20110206829-A1 | COMPOSITION FOR STRIPPING AND STRIPPING METHOD | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-08-25 | — | — | US | disclosed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | disclosed |
| CN-101398639-A | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO LTD (KR) | 2009-04-01 | — | — | CN | disclosed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | disclosed |
| EP-0838508-B1 | Aqueous ink composition for use in an ink-jet printer | SEIKO EPSON CORP (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |
| US-5871572-A | COLORANT, WATER, A WATER-SOLUBLE ORGANIC SOLVENT, AND PECTIC ACID | SEIKO EPSON CORPORATION (JP) | 1999-02-16 | — | — | US | disclosed |
| EP-0838508-A2 | Aqueous ink composition for use in an ink-jet printer | SEIKO EPSON CORPORATION (JP) | 1998-04-29 | — | — | EP | disclosed |