SCHEMBL12855111

SCHEMBL12855111

OCCCOc1ccc(C(c2ccc(OCC3CO3)cc2)C(c2ccc(OCC3CO3)cc2)c2ccc(OCC3CO3)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TDP1 Q9NUW8 2/20 0.50
▸ ALDH1A1 P00352 5/20 0.48
▸ TP53 P04637 3/20 0.48
▸ TSHR P16473 3/20 0.48
▸ MAPT P10636 2/20 0.48
▸ HPGD P15428 2/20 0.48
▸ HIF1A Q16665 2/20 0.48
▸ MEN1 O00255 2/20 0.48
▸ KMT2A Q03164 2/20 0.48
▸ PKM P14618 2/20 0.48
▸ CYP1A2 P05177 1/20 0.48
▸ PPARG P37231 1/20 0.48
▸ LMNA P02545 1/20 0.48
▸ GAA P10253 1/20 0.48
▸ SMN1; SMN2 Q16637 3/20 0.45
▸ CYP3A4 P08684 1/20 0.45
▸ GLA P06280 1/20 0.36
▸ FGFR1 P11362 1/20 0.34
▸ SRC P12931 1/20 0.34
▸ HRH3 Q9Y5N1 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16644997 0.95 TDP1 (0.45) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL13555513 0.91 TDP1 (0.50) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL13621716 0.91 TDP1 (0.50) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL14397616 0.91 TDP1 (0.59) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL16644953 0.90 TDP1 (0.41) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL11890735 0.89 ALDH1A1 (0.49) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL22294896 0.87 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL31450 0.87 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL16488801 0.87 TDP1 (0.63) TDP1ALDH1A1TP53TSHRMAPT
SCHEMBL16640928 0.87 ALDH1A1 (0.53) TDP1ALDH1A1TP53TSHRMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2960245-A1 EPOXY COMPOUND HAVING ALKOXYSILYL GROUP, METHOD FOR MANUFACTURING SAME, COMPOSITION AND CURED PRODUCT INCLUDING SAME, AND USE THEREOF Korea Institute of Industrial Technology (KR) 2015-12-30 — — EP disclosed
US-20150357599-A1 BARRIER LAMINATE AND GAS BARRIER FILM FUJIFILM CORPORATION (JP) 2015-12-10 — — US disclosed
EP-2891686-A1 DISPERSION COMPOSITION, AND CURABLE COMPOSITION, TRANSPARENT FILM, MICROLENS AND SOLID-STATE IMAGING ELEMENT USING SAME FUJIFILM Corporation (JP) 2015-07-08 — — EP disclosed
US-8278401-B2 Radiation or thermally curable barrier sealants HENKEL AG & CO. KGAA (DE) 2012-10-02 — — US disclosed
WO-2009143482-A2 NEGATIVE TONE MOLECULAR GLASS RESISTS AND METHODS OF MAKING AND USING SAME GEORGIA TECH RESEARCH CORPORATION (US) 2009-11-26 — — WO disclosed
WO-2007111606-A1 RADIATION-OR THERMALLY-CURABLE BARRIER SEALANTS NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) 2007-10-04 — — WO disclosed
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