SCHEMBL12867222

SCHEMBL12867222

O=C(Nc1cccc(OCC2CCCCC2)c1)c1cc2ccccc2c(N=Nc2ccc(-c3nnc(-c4ccc(N=Nc5c(O)cc6c(=O)n7c8ccccc8nc7c7cccc5c67)cc4)o3)cc2)c1O

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ NQO2 P16083 1/20 0.35
▸ MGLL Q99685 1/20 0.34
▸ MEN1 O00255 3/20 0.33
▸ MAPT P10636 3/20 0.33
▸ KMT2A Q03164 3/20 0.33
▸ CAMKK1 Q8N5S9 2/20 0.33
▸ CAMKK2 Q96RR4 2/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP2D6 P10635 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ CASP1 P29466 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ CASP7 P55210 1/20 0.33
▸ SIRT2 Q8IXJ6 1/20 0.33
▸ POLB P06746 4/20 0.33
▸ ALDH1A1 P00352 3/20 0.33
▸ HPGD P15428 3/20 0.33
▸ NPSR1 Q6W5P4 2/20 0.33
▸ TSHR P16473 2/20 0.33
▸ MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13018369 0.92 NQO2 (0.35) NQO2MEN1MAPTKMT2ACAMKK1
SCHEMBL12556944 0.87 NQO2 (0.46) NQO2MEN1MAPTKMT2ACAMKK1
SCHEMBL10036461 0.85 NQO2 (0.44) NQO2MEN1MAPTKMT2ASIRT2
SCHEMBL11911553 0.85 NQO2 (0.46) NQO2MEN1MAPTKMT2ACAMKK1
SCHEMBL11911556 0.80 KMT2A (0.39) NQO2MEN1MAPTKMT2ACAMKK1
SCHEMBL12556935 0.78 KMT2A (0.48) MEN1MAPTKMT2ACAMKK1CAMKK2
SCHEMBL11911557 0.75 KMT2A (0.48) MEN1MAPTKMT2ACAMKK1CAMKK2
SCHEMBL13373962 0.73 MEN1 (0.38) MGLLMEN1MAPTKMT2ASIRT2
SCHEMBL17059538 0.71 KMT2A (0.40) MEN1MAPTKMT2ACAMKK1CAMKK2
SCHEMBL12733285 0.71 KMT2A (0.42) NQO2MEN1MAPTKMT2ACAMKK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8906586-B2 Coating fluid for photosensitive-layer formation, process for producing the same, photoreceptor produced with the coating fluid, image-forming apparatus employing the photoreceptor, and electrophotographic cartridge employing the photoreceptor MITSUBISHI CHEMICAL CORPORATION (JP) 2014-12-09 — — US disclosed
US-8906586-B2 Coating fluid for photosensitive-layer formation, process for producing the same, photoreceptor produced with the coating fluid, image-forming apparatus employing the photoreceptor, and electrophotographic cartridge employing the photoreceptor MITSUBISHI CHEMICAL CORPORATION (JP) 2014-12-09 — — US disclosed
US-8288066-B2 Electroconductive support with a photosensitive layer of an arylamine-based compound; high sensitivity, chargeability, residual potential, light resistance MITSUBISHI CHEMICAL CORPORATION (JP) 2012-10-16 — — US disclosed
US-20110033792-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND IMAGE-FORMING APPARATUS MITSUBISHI CHEMICAL CORPORATION (JP) 2011-02-10 — — US disclosed
US-20090202274-A1 COATING FLUID FOR PHOTOSENSITIVE-LAYER FORMATION, PROCESS FOR PRODUCING THE SAME, PHOTORECEPTOR PRODUCED WITH THE COATING FLUID, IMAGE-FORMING APPARATUS EMPLOYING THE PHOTORECEPTOR, AND ELECTROPHOTOGRAPHIC CARTRIDGE EMPLOYING THE PHOTORECEPTOR MITSUBISHI CHEMICAL CORPORATION (JP) 2009-08-13 — — US disclosed
US-20080193867-A1 Electrophotographic Photoreceptor and Image-Forming Apparatus MITSUBISHI CHEMICAL CORPORATION (JP) 2008-08-14 — — US disclosed
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