Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 6/20 | 0.38 |
| ▸ | MEN1 | O00255 | 5/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 3/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 5/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 4/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17313457 | 0.88 | CYP2D6 (0.39) | KMT2AMEN1SLC6A2SLC6A4ALDH1A1 | |
| SCHEMBL5133451 | 0.87 | MEN1 (0.40) | KMT2AMEN1SLC6A2SLC6A4L3MBTL1 | |
| SCHEMBL5134036 | 0.82 | MEN1 (0.40) | KMT2AMEN1SLC6A2SLC6A4L3MBTL1 | |
| SCHEMBL5133109 | 0.81 | MEN1 (0.40) | KMT2AMEN1SLC6A2SLC6A4L3MBTL1 | |
| SCHEMBL11007558 | 0.81 | L3MBTL1 (0.38) | KMT2AMEN1SLC6A2SLC6A4L3MBTL1 | |
| SCHEMBL1152090 | 0.80 | SLC6A2 (0.38) | KMT2AMEN1SLC6A2SLC6A4L3MBTL1 | |
| SCHEMBL7351810 | 0.78 | L3MBTL1 (0.46) | KMT2AMEN1L3MBTL1ALDH1A1MAPT | |
| SCHEMBL7346904 | 0.78 | L3MBTL1 (0.46) | KMT2AMEN1L3MBTL1ALDH1A1MAPT | |
| SCHEMBL7352760 | 0.78 | L3MBTL1 (0.42) | KMT2AMEN1L3MBTL1ALDH1A1HDAC3 | |
| SCHEMBL7384561 | 0.78 | L3MBTL1 (0.42) | KMT2AMEN1L3MBTL1ALDH1A1HDAC3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014149281-A1 | LAYER-BY-LAYER DEPOSITION OF CARBON-DOPED OXIDE FILMS | APPLIED MATERIALS, INC. (US) | 2014-09-25 | — | — | WO | claimed |
| WO-2020028065-A1 | CVD BASED SPACER DEPOSITION WITH ZERO LOADING | APPLIED MATERIALS, INC. (US) | 2020-02-06 | — | — | WO | disclosed |
| WO-2014149281-A1 | LAYER-BY-LAYER DEPOSITION OF CARBON-DOPED OXIDE FILMS | APPLIED MATERIALS, INC. (US) | 2014-09-25 | — | — | WO | disclosed |
| WO-2013106171-A1 | METHOD FOR SEASONING UV CHAMBER OPTICAL COMPONENTS TO AVOID DEGRADATION | APPLIED MATERIALS, INC. (US) | 2013-07-18 | — | — | WO | disclosed |
| WO-2012047742-A2 | ULTRA HIGH SELECTIVITY DOPED AMORPHOUS CARBON STRIPPABLE HARDMASK DEVELOPMENT AND INTEGRATION | APPLIED MATERIALS, INC. (US) | 2012-04-12 | — | — | WO | disclosed |
| WO-2011137059-A2 | AMORPHOUS CARBON DEPOSITION METHOD FOR IMPROVED STACK DEFECTIVITY | APPLIED MATERIALS, INC. (US) | 2011-11-03 | — | — | WO | disclosed |
| WO-2010045153-A2 | METHOD FOR DEPOSITING CONFORMAL AMORPHOUS CARBON FILM BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) | APPLIED MATERIALS, INC. (US) | 2010-04-22 | — | — | WO | disclosed |
| WO-2009111395-A2 | METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSITY AND STEP COVERAGE | APPLIED MATERIALS, INC. (US) | 2009-09-11 | — | — | WO | disclosed |
| WO-2008094792-A1 | NOVEL AIR GAP INTEGRATION SCHEME | APPLIED MATERIALS, INC. (US) | 2008-08-07 | — | — | WO | disclosed |
| EP-1599898-A2 | METHOD TO IMPROVE CRACKING THRESHOLDS AND MECHANICAL PROPERTIES OF LOW-K DIELECTRIC MATERIAL | Applied Materials, Inc. (US) | 2005-11-30 | — | — | EP | disclosed |
| EP-1588410-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | Applied Materials, Inc. (US) | 2005-10-26 | — | — | EP | disclosed |
| WO-2005087974-A2 | CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS | APPLIED MATERIALS, INC. (US) | 2005-09-22 | — | — | WO | disclosed |
| WO-2004064136-A1 | A METHOD OF IMPROVING STABILITY IN LOW K BARRIER LAYERS | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | disclosed |
| WO-2004063417-A2 | METHOD TO IMPROVE CRACKING THRESHOLDS AND MECHANICAL PROPERTIES OF LOW-K DIELECTRIC MATERIAL | APPLIED MATERIALS, INC. (US) | 2004-07-29 | — | — | WO | disclosed |