SCHEMBL1289526

SCHEMBL1289526

[CH2]CCC(CCC)(CCC)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17607388 0.88
SCHEMBL27993248 0.82 FDPS (0.33)
SCHEMBL8927878 0.81 TSHR (0.33)
SCHEMBL7643148 0.77 TSHR (0.42)
SCHEMBL6320469 0.77 TSHR (0.42)
SCHEMBL3419763 0.76
SCHEMBL7938988 0.76
SCHEMBL25200900 0.75 TSHR (0.40)
SCHEMBL29291862 0.75 TSHR (0.40)
SCHEMBL27881162 0.75 TSHR (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3501488-B1 AQUEOUS SILICONE POLYMER COMPOSITIONS MOMENTIVE PERFORMANCE MAT GMBH (DE) 2021-04-14 EP disclosed
US-10947383-B2 Aqueous silicone polymer compositions MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2021-03-16 US disclosed
US-20190194457-A1 AQUEOUS SILICONE POLYMER COMPOSITIONS MOMENTIVE PERFORMANCE MATERIALS GMBH (DE) 2019-06-27 US disclosed
EP-3501488-A1 AQUEOUS SILICONE POLYMER COMPOSITIONS Momentive Performance Materials GmbH (DE) 2019-06-26 EP disclosed
US-9152048-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-10-06 US disclosed
WO-2014072998-A1 AN IMPROVED PROCESS FOR PREPARATION OF AGOMELATINE CADILA HEALTHCARE LIMITED (IN) 2014-05-15 WO disclosed
WO-2012046253-A2 PROCESS FOR THE PREPARATION OF N-[2- (7-METHOXY-L-NAPHTHYL) ETHYL] ACETAMIDE AND ITS NOVEL CRYSTALLINE FORMS MSN LABORATORIES LIMITED (IN) 2012-04-12 WO disclosed
US-20110091809-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-04-21 US disclosed
EP-0307519-B1 Perfluoroalkylation process ETHYL CORPORATION (US) 1991-04-17 EP disclosed
EP-0307519-A1 Perfluoroalkylation process ETHYL CORPORATION (US) 1989-03-22 EP disclosed
US-4814480-A Trifluoromethylation process ETHYL CORPORATION (US) 1989-03-21 US disclosed
US-4814482-A Trifluoromethylation process ETHYL CORPORATION (US) 1989-03-21 US disclosed
US-4785131-A Substituted cyanonaphthalene process ETHYL CORPORATION (US) 1988-11-15 US disclosed
US-4762943-A Aromatization process ETHYL CORPORATION (US) 1988-08-09 US disclosed
EP-0254422-A1 Aromatization process ETHYL CORPORATION (US) 1988-01-27 EP disclosed
EP-0035087-B1 PROCESS FOR THE PREPARATION OF 1H-AZOLE DERIVATIVES CIBA-GEIGY AG (CH) 1985-02-20 EP disclosed