SCHEMBL12898533

SCHEMBL12898533

CCO[SiH](C[Si](C)(OCC)OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10308291 0.80
SCHEMBL10308288 0.78
SCHEMBL16046978 0.77
SCHEMBL9121658 0.76
SCHEMBL13089260 0.76
SCHEMBL13089421 0.75
SCHEMBL13089396 0.75
SCHEMBL13089276 0.74
SCHEMBL13089286 0.72
SCHEMBL12898530 0.72 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3663301-B1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-08-30 EP claimed
US-10985013-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2021-04-20 US claimed
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices VERSUM MATERIALS US, LLC (US) 2019-10-03 US claimed
US-10354860-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2019-07-16 US claimed
US-20180047898-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. 2018-02-15 US claimed
EP-3268997-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY Versum Materials US, LLC (US) 2018-01-17 EP claimed
WO-2016144960-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-09-15 WO claimed
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-04 US claimed
EP-3051001-A2 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-03 EP claimed
EP-3663301-B1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-08-30 EP disclosed
US-11605535-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films VERSUM MATERIALS US, LLC (US) 2023-03-14 US disclosed
US-10985013-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2021-04-20 US disclosed
US-20200365401-A1 Boron-Containing Compounds, Compositions, And Methods For The Deposition Of A Boron Containing Films VERSUM MATERIALS US, LLC (US) 2020-11-19 US disclosed
US-10763103-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films VERSUM MATERIALS US, LLC (US) 2020-09-01 US disclosed
WO-2016160800-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-10-06 WO disclosed
WO-2016144960-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-09-15 WO disclosed
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-04 US disclosed
EP-3051001-A2 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-03 EP disclosed
US-20110042789-A1 MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM JSR CORPORATION (JP) 2011-02-24 US disclosed
US-20100261925-A1 METHOD FOR PRODUCING SILICON COMPOUND JSR CORPORATION (JP) 2010-10-14 US disclosed