Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12943142 | 0.87 | EPHX2 (0.37) | EPHX2NPSR1TSHRALDH1A1MEN1 | |
| SCHEMBL12907434 | 0.84 | — | — | |
| SCHEMBL11950508 | 0.83 | CA12 (0.40) | EPHX2NPSR1ALDH1A1MEN1KMT2A | |
| SCHEMBL11911870 | 0.83 | CA12 (0.40) | EPHX2NPSR1ALDH1A1MEN1KMT2A | |
| SCHEMBL14330182 | 0.82 | LMNA (0.35) | EPHX2NPSR1TSHRALDH1A1MEN1 | |
| SCHEMBL5101830 | 0.78 | EPHX2 (0.42) | EPHX2NPSR1TSHRALDH1A1MEN1 | |
| SCHEMBL12907421 | 0.76 | — | — | |
| SCHEMBL14330186 | 0.73 | EPHX2 (0.36) | EPHX2NPSR1TSHRALDH1A1MEN1 | |
| SCHEMBL13455115 | 0.73 | CYP17A1 (0.41) | EPHX2NPSR1TSHRALDH1A1MEN1 | |
| SCHEMBL17899105 | 0.72 | EPHX2 (0.35) | EPHX2NPSR1TSHRALDH1A1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7871755-B2 | Photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-01-18 | — | — | US | disclosed |
| US-20090081582-A1 | irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation | KABUSHIKI KAISHA TOSHIBA | 2009-03-26 | — | — | US | disclosed |