Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 6/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.40 |
| ▸ | BCHE | P06276 | 1/20 | 0.40 |
| ▸ | CES1 | P23141 | 1/20 | 0.40 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | S100A4 | P26447 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 7/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.38 |
| ▸ | ATM | Q13315 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | HEXA | P06865 | 1/20 | 0.37 |
| ▸ | HEXB | P07686 | 1/20 | 0.37 |
| ▸ | RXFP1 | Q9HBX9 | 3/20 | 0.36 |
| ▸ | PABPC1 | P11940 | 2/20 | 0.36 |
| ▸ | CASP1 | P29466 | 2/20 | 0.35 |
| ▸ | CASP7 | P55210 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20495669 | 0.87 | MEN1 (0.56) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL31121101 | 0.87 | MEN1 (0.56) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL129395 | 0.80 | MAPK1 (0.52) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL131338 | 0.80 | MAPK1 (0.47) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL131339 | 0.80 | MAPK1 (0.47) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL130313 | 0.80 | MAPK1 (0.47) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL130314 | 0.80 | MAPK1 (0.47) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL4512216 | 0.80 | MEN1 (0.47) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| Hydrochloric Acid SCHEMBL10599412 | 0.78 | MAPK1 (0.46) | MEN1KMT2AMAPK1MAPTALDH1A1 | |
| SCHEMBL7195529 | 0.77 | MAPK1 (0.44) | MEN1KMT2AMAPK1MAPTALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1386904-B1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR CORP (JP) | 2008-09-17 | — | — | EP | claimed |
| US-7037994-B2 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR CORPORATION (JP) | 2006-05-02 | — | — | US | claimed |
| US-20040034155-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR CORPORATION (JP) | 2004-02-19 | — | — | US | claimed |
| EP-1386904-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR Corporation (JP) | 2004-02-04 | — | — | EP | claimed |
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | JSR CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12312487-B2 | Method for forming protective film, method for manufacturing patterned substrate, and composition | JSR CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| WO-2025018305-A1 | METHOD FOR MANUFACTURING MAGNETIC TUNNEL JUNCTION ELEMENT | JSR株式会社 | 2025-01-23 | — | — | WO | disclosed |
| WO-2024205936-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | INPRIA CORPORATION (US) | 2024-10-03 | — | — | WO | disclosed |
| US-20240319599-A1 | GAS RELEASING UNDERLAYERS FOR PHOTOPATTERNABLE ORGANOMETALLIC RESIST | JSR CORPORATION (JP) | 2024-09-26 | — | — | US | disclosed |
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20230242787-A1 | METHOD FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING PATTERNED SUBSTRATE, AND COMPOSITION | JSR CORPORATION (JP) | 2023-08-03 | — | — | US | disclosed |
| CN-112635292-B | Thermal desorption ionization mechanism verification device and application thereof | 四川师范大学 | 2023-06-27 | — | — | CN | disclosed |
| EP-1510210-A1 | IMMUNITY-RELATED PROTEIN KINASE INHIBITORS | Institute of Medicinal Molecular Design, Inc. (JP) | 2005-03-02 | — | — | EP | disclosed |
| US-20040259877-A1 | Inhibitors against the production and release of inflammatory cytokines | INSTITUTE OF MEDICINAL MOLECULAR DESIGN, INC. (JP) | 2004-12-23 | — | — | US | disclosed |
| US-20040206940-A1 | Novel method of preparing nitrogen macrocycles | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2004-10-21 | — | — | US | disclosed |
| JP-2004168748-A | ACENAPHTHYLENE DERIVATIVE, POLYMER, AND ANTIREFLECTION FILM FORMING COMPOSITION | JSR CORP | 2004-06-17 | — | — | JP | disclosed |
| US-20040034155-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR CORPORATION (JP) | 2004-02-19 | — | — | US | disclosed |
| EP-1386904-A1 | Acenaphthylene derivative, polymer, and antireflection film-forming composition | JSR Corporation (JP) | 2004-02-04 | — | — | EP | disclosed |
| EP-1352650-A1 | INHIBITORS AGAINST THE PRODUCTION AND RELEASE OF INFLAMMATORY CYTOKINES | Institute of Medicinal Molecular Design, Inc. (JP) | 2003-10-15 | — | — | EP | disclosed |
| US-20030073040-A1 | Pattern forming method and bilayer film | JSR CORPORATION (JP) | 2003-04-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12572075-B2 | Composition, method of forming resist underlayer film, and method of forming resist pattern | TOP1, NAF1, ASH2L | MEN1 1539/4885KMT2A 511/4885MAPK1 3188/4885 |
| US-20040259877-A1 | Inhibitors against the production and release of inflammatory cytokines | NFKBIA, IL1B, IKBKB | MEN1 4661/4885KMT2A 4095/4885MAPK1 151/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.