⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1296484 | 0.92 | — | — | |
| SCHEMBL133571 | 0.75 | — | — | |
| SCHEMBL2521347 | 0.65 | — | — | |
| SCHEMBL2149222 | 0.65 | — | — | |
| SCHEMBL17245048 | 0.65 | — | — | |
| SCHEMBL28699607 | 0.65 | — | — | |
| SCHEMBL3890486 | 0.62 | — | — | |
| SCHEMBL17468497 | 0.62 | — | — | |
| SCHEMBL3993263 | 0.62 | — | — | |
| SCHEMBL15528838 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1698614-B1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | ADEKA CORP (JP) | 2011-07-13 | — | — | EP | claimed |
| US-20070122947-A1 | Metal compound, material for thin film formation, and process of forming thin film | ADEKA CORPORATION (JP) | 2007-05-31 | — | — | US | claimed |
| EP-1698614-A1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | Asahi Denka Co., Ltd. (JP) | 2006-09-06 | — | — | EP | claimed |
| US-20050272200-A1 | Bismuth titanium silicon oxide, bismuth titanium silicon oxide thin film, and method for forming the thin film | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-12-08 | — | — | US | claimed |
| EP-3178808-B1 | ALKOXIDE COMPOUND, THIN FILM-FORMING STARTING MATERIAL, THIN FILM FORMATION METHOD AND ALCOHOL COMPOUND | ADEKA CORP (JP) | 2024-11-06 | — | — | EP | disclosed |
| US-11618762-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2023-04-04 | — | — | US | disclosed |
| US-20220017554-A1 | COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND AMIDINE COMPOUND | ADEKA CORPORATION (JP) | 2022-01-20 | — | — | US | disclosed |
| US-11161867-B2 | Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound | ADEKA CORPORATION (JP) | 2021-11-02 | — | — | US | disclosed |
| EP-3505511-B1 | DIAZADIENYL COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-10920313-B2 | Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film | ADEKA CORPORATION (JP) | 2021-02-16 | — | — | US | disclosed |
| US-10882874-B2 | Vanadium compound | ADEKA CORPORATION (JP) | 2021-01-05 | — | — | US | disclosed |
| EP-3476827-B1 | VANADIUM COMPOUND, STARTING MATERIAL FOR THIN FILM FORMATION, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2020-09-16 | — | — | EP | disclosed |
| EP-1698614-B1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | ADEKA CORP (JP) | 2011-07-13 | — | — | EP | disclosed |
| US-20110079262-A1 | DIFFUSING AGENT COMPOSITION, METHOD OF FORMING IMPURITY DIFFUSION LAYER, AND SOLAR BATTERY | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-07 | — | — | US | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20100028536-A1 | METAL COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS OF FORMING THIN FILM | ADEKA CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| US-20090320771-A1 | IONIC LIQUID MEDIUMS FOR HOLDING SOLID PHASE PROCESS GAS PRECURSORS | MATHESON TRI-GAS (US) | 2009-12-31 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20070122947-A1 | Metal compound, material for thin film formation, and process of forming thin film | ADEKA CORPORATION (JP) | 2007-05-31 | — | — | US | disclosed |
| EP-1698614-A1 | METAL COMPOUND, MATERIAL FOR FORMING THIN FILM AND METHOD FOR PREPARING THIN FILM | Asahi Denka Co., Ltd. (JP) | 2006-09-06 | — | — | EP | disclosed |