SCHEMBL12977548

SCHEMBL12977548

CC(=O)OC1CCC(C(=O)OCCOC(=O)C(F)(F)S(=O)(=O)O)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12972055 0.84 ALDH1A1 (0.32) —
SCHEMBL14770323 0.81 MEN1 (0.31) —
SCHEMBL12977194 0.81 ALDH1A1 (0.36) —
SCHEMBL12947971 0.78 — —
SCHEMBL26488836 0.75 ALDH1A1 (0.41) —
SCHEMBL14228089 0.73 ALDH1A1 (0.48) —
SCHEMBL27799058 0.72 MAPT (0.49) —
SCHEMBL13225194 0.72 ALDH1A1 (0.43) —
SCHEMBL18789504 0.71 MEN1 (0.32) —
SCHEMBL14774016 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8318404-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-11-27 — — US disclosed
US-20100316952-A1 SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-16 — — US disclosed
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