SCHEMBL13009678

SCHEMBL13009678

CCC(C)C(=O)Oc1ccc2cc(S(=O)(=O)O)ccc2c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ KDM4E B2RXH2 3/20 0.40
▸ SNCA P37840 2/20 0.40
▸ TSHR P16473 2/20 0.40
▸ GAA P10253 2/20 0.40
▸ LMNA P02545 2/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ CYP2D6 P10635 1/20 0.40
▸ ALDH1A1 P00352 3/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ HSD17B10 Q99714 2/20 0.40
▸ HPGD P15428 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.38
▸ RECQL P46063 1/20 0.38
▸ PKM P14618 2/20 0.38
▸ CASP6 P55212 2/20 0.37
▸ CYP2C9 P11712 1/20 0.37
▸ CYP2C19 P33261 1/20 0.37
▸ AKR1C3 P42330 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12385796 0.87 POLB (0.42) KMT2ATSHRGAALMNAALDH1A1
SCHEMBL10000788 0.87 AKR1C3 (0.44) MEN1KMT2ATSHRGAALMNA
SCHEMBL19845107 0.84 CASR (0.41) KMT2ATSHRLMNAALDH1A1HSD17B10
SCHEMBL12419167 0.81 PPARG (0.50) MEN1KMT2AKDM4EALDH1A1SMN1; SMN2
SCHEMBL12419166 0.80 PPARG (0.46) MEN1KMT2AKDM4EALDH1A1HSD17B10
SCHEMBL12419170 0.80 KMT2A (0.45) KMT2AKDM4EGAALMNAALDH1A1
SCHEMBL10053083 0.80 ESR1 (0.47) MEN1KMT2AGAALMNAHSD17B10
SCHEMBL12419183 0.78 KDM4E (0.45) KDM4ELMNAALDH1A1L3MBTL1PKM
SCHEMBL12419180 0.78 LMNA (0.58) MEN1KMT2ALMNACYP3A4SMN1; SMN2
SCHEMBL18232618 0.77 POLB (0.58) MEN1KMT2AKDM4ESNCAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8361693-B2 Chemically amplified positive photoresist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-29 — — US disclosed
US-20100316955-A1 CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-16 — — US disclosed
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