⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13011840 | 0.87 | — | — | |
| SCHEMBL13011922 | 0.85 | — | — | |
| SCHEMBL16708367 | 0.84 | — | — | |
| SCHEMBL10099530 | 0.81 | — | — | |
| SCHEMBL22399892 | 0.79 | — | — | |
| SCHEMBL13012009 | 0.77 | — | — | |
| SCHEMBL13011331 | 0.76 | — | — | |
| SCHEMBL15854511 | 0.76 | — | — | |
| SCHEMBL13011298 | 0.74 | — | — | |
| SCHEMBL15081155 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-9996008-B2 | Photoresist pattern trimming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-12 | — | — | US | disclosed |
| US-9666436-B2 | Ion implantation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-05-30 | — | — | US | disclosed |
| US-20170045822-A1 | PHOTORESIST PATTERN TRIMMING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-02-16 | — | — | US | disclosed |
| US-20170045822-A1 | PHOTORESIST PATTERN TRIMMING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-02-16 | — | — | US | disclosed |
| US-9051405-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150132698-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-14 | — | — | US | disclosed |
| US-20140187027-A1 | ION IMPLANTATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2014-07-03 | — | — | US | disclosed |
| US-20130171574-A1 | PHOTORESIST PATTERN TRIMMING METHODS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-07-04 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |