SCHEMBL13017019

SCHEMBL13017019

Cl[Si](Cl)(Cl)CCCn1ccnn1

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 6/20 0.41
ATP4A P20648 1/20 0.34
ATP4B P51164 1/20 0.34
DPP4 P27487 1/20 0.33
FOLH1 Q04609 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13017018 0.84 CYP19A1 (0.39) CYP19A1ATP4AATP4BDPP4
SCHEMBL1892841 0.78
SCHEMBL5203482 0.77 CYP19A1 (0.42) CYP19A1ATP4AATP4BDPP4FOLH1
SCHEMBL11361006 0.77 CYP19A1 (0.48) CYP19A1DPP4FOLH1
SCHEMBL725806 0.75 CYP19A1 (0.41) CYP19A1ATP4AATP4BDPP4FOLH1
SCHEMBL13017013 0.75 CYP19A1 (0.34) CYP19A1ATP4AATP4BDPP4
SCHEMBL1098635 0.74
SCHEMBL724736 0.74
SCHEMBL1179086 0.74
SCHEMBL1289862 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100330505-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-30 US disclosed