SCHEMBL13017154

SCHEMBL13017154

CC(C)(C)C(C)(C)CCCn1cncn1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGLN3 Q9H6Z9 1/20 0.42
ALDH1A1 P00352 3/20 0.41
CYP3A4 P08684 1/20 0.41
MEN1 O00255 4/20 0.39
KMT2A Q03164 4/20 0.39
MAPT P10636 3/20 0.39
LMNA P02545 2/20 0.39
KDM4E B2RXH2 2/20 0.39
SMN1; SMN2 Q16637 2/20 0.38
MAPK1 P28482 1/20 0.38
NPC1 O15118 1/20 0.37
TP53 P04637 1/20 0.37
NFKB1 P19838 1/20 0.37
RAB9A P51151 1/20 0.37
NFKB2 Q00653 1/20 0.37
RELA Q04206 1/20 0.37
TSHR P16473 2/20 0.36
GAA P10253 1/20 0.36
USP2 O75604 1/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13017117 0.85 EGLN3 (0.44) EGLN3ALDH1A1CYP3A4MEN1KMT2A
SCHEMBL14003700 0.78 MEN1 (0.42) EGLN3ALDH1A1CYP3A4MEN1KMT2A
SCHEMBL848180 0.77 EGLN3 (0.42) EGLN3ALDH1A1CYP3A4MEN1KMT2A
SCHEMBL10338984 0.77 EGLN3 (0.56) EGLN3ALDH1A1MEN1KMT2AMAPT
SCHEMBL17159811 0.77 EGLN3 (0.56) EGLN3ALDH1A1MEN1KMT2AMAPT
SCHEMBL10721461 0.76 EGLN3 (0.47) EGLN3ALDH1A1CYP3A4MEN1KMT2A
SCHEMBL13017119 0.74 HSP90AA1 (0.51) ALDH1A1MEN1KMT2AMAPTLMNA
SCHEMBL3371124 0.73 EGLN3 (0.44) EGLN3ALDH1A1CYP3A4MEN1KMT2A
SCHEMBL8661566 0.72 EGLN3 (0.47) EGLN3ALDH1A1MEN1KMT2AMAPT
SCHEMBL11485316 0.71 TBXAS1 (0.46) EGLN3ALDH1A1MEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100330505-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING CYCLIC AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-30 US disclosed