SCHEMBL13027468

SCHEMBL13027468

COc1cc(CC[Si](OC)(OC)OC)cc(OC)c1C

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTR2A P28223 2/20 0.41
▸ HTR2C P28335 2/20 0.41
▸ HTR2B P41595 2/20 0.41
▸ MEN1 O00255 1/20 0.41
▸ KMT2A Q03164 1/20 0.41
▸ RXFP1 Q9HBX9 1/20 0.41
▸ TNKS2 Q9H2K2 1/20 0.41
▸ TUBB4A P04350 2/20 0.38
▸ TUBB P07437 2/20 0.38
▸ TUBA3C P0DPH7 2/20 0.38
▸ TUBA1B P68363 2/20 0.38
▸ TUBA4A P68366 2/20 0.38
▸ TUBB4B P68371 2/20 0.38
▸ TUBB3 Q13509 2/20 0.38
▸ TUBB2A Q13885 2/20 0.38
▸ TUBB8 Q3ZCM7 2/20 0.38
▸ TUBA3E Q6PEY2 2/20 0.38
▸ TUBA1A Q71U36 2/20 0.38
▸ TUBA1C Q9BQE3 2/20 0.38
▸ TUBB6 Q9BUF5 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13027412 0.91 HTR2A (0.38) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL15672341 0.85 HTR2A (0.40) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL13027458 0.84 HTR2A (0.60) HTR2AHTR2CHTR2BTUBB4ATUBB
SCHEMBL13027626 0.83 HTR2A (0.35) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL15672393 0.82 HTR2A (0.49) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL13027286 0.82 MEN1 (0.38) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL13027389 0.82 TUBB1 (0.32) HTR2AHTR2CHTR2BMEN1KMT2A
SCHEMBL13027417 0.79 ATM (0.44) KMT2AAOC3CYP19A1CA2ATM
SCHEMBL13027392 0.79 KMT2A (0.34) HTR2AHTR2CHTR2BKMT2ATNKS2
SCHEMBL25916974 0.79 PGK1 (0.33) HTR2AHTR2CHTR2BMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8697330-B2 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-04-15 — — US disclosed
US-20100285407-A1 Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-11 — — US disclosed
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