Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.79 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | POLB | P06746 | 1/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 5/20 | 0.50 |
| ▸ | CA2 | P00918 | 3/20 | 0.50 |
| ▸ | CA9 | Q16790 | 3/20 | 0.50 |
| ▸ | CA7 | P43166 | 2/20 | 0.50 |
| ▸ | IDO1 | P14902 | 1/20 | 0.50 |
| ▸ | AGXT | P21549 | 1/20 | 0.48 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.47 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.47 |
| ▸ | LTA4H | P09960 | 1/20 | 0.47 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.46 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene Glycol SCHEMBL27981962 | 0.97 | TSHR (0.75) | TSHRKDM4EPOLBTDP1CA1 | |
| Ethylene Glycol SCHEMBL10895397 | 0.95 | TSHR (0.71) | TSHRKDM4EPOLBTDP1CA1 | |
| Biphenyl SCHEMBL10530521 | 0.93 | TSHR (0.68) | TSHRKDM4EPOLBTDP1CA1 | |
| Hydrogen Peroxide SCHEMBL28758135 | 0.92 | TSHR (0.94) | TSHRKDM4EPOLBTDP1CA1 | |
| 1,3-Propanediol SCHEMBL5661460 | 0.90 | TSHR (0.71) | TSHRKDM4EPOLBTDP1CA1 | |
| SCHEMBL5311581 | 0.89 | TSHR (1.00) | TSHRKDM4EPOLBCA1CA2 | |
| Benzene SCHEMBL27997624 | 0.89 | TSHR (1.00) | TSHRKDM4EPOLBCA1CA2 | |
| SCHEMBL27380 | 0.89 | TSHR (1.00) | TSHRKDM4EPOLBCA1CA2 | |
| Di(Hydroxyethyl)Ether SCHEMBL1674848 | 0.88 | TSHR (0.68) | TSHRKDM4EPOLBTDP1CA1 | |
| Propanol SCHEMBL1756185 | 0.88 | TSHR (0.68) | TSHRKDM4EPOLBTDP1CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1525 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118777449-B | Method for separating and detecting related substances in benzyl-2-bromoethyl ether serving as starting material of ubenimex based on gas chromatography and liquid chromatography | 山东泰合医药科技有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-118388561-A | Method for separating lignocellulose and co-producing alkyl xylosides, high-purity cellulose and lignin by full components | 中国科学院广州能源研究所 | 2024-07-26 | — | — | CN | claimed |
| CN-118027744-A | Oil-in-water emulsified medium oil ink and preparation method thereof | 丰城三友制笔科技有限公司 | 2024-05-14 | — | — | CN | claimed |
| CN-116043233-A | Water-based cleaning agent and preparation method thereof | 上海承鲁科技有限公司 | 2023-05-02 | — | — | CN | claimed |
| CN-113522379-B | Micro-wall array and preparation method and application thereof, micro-channel and preparation method thereof, micro-channel reactor and application thereof | 中国科学院化学研究所 | 2023-04-07 | — | — | CN | claimed |
| US-20220166043-A1 | NEGATIVE ELECTRODE ELECTROLYTE SOLUTION FOR REDOX FLOW BATTERIES, AND REDOX FLOW BATTERY | ARM TECHNOLOGIES CO., LTD. (JP) | 2022-05-26 | — | — | US | claimed |
| CN-111655832-B | Mildew-removing cleaning agent composition for hard surface | 花王株式会社 | 2022-05-17 | — | — | CN | claimed |
| EP-3955351-A1 | NEGATIVE ELECTRODE ELECTROLYTE SOLUTION FOR REDOX FLOW BATTERIES, AND REDOX FLOW BATTERY | Arm Technologies Co., Ltd. (JP) | 2022-02-16 | — | — | EP | claimed |
| CN-113728477-A | Negative electrode electrolyte for redox flow battery and redox flow battery | ARM技术股份有限公司 | 2021-11-30 | — | — | CN | claimed |
| CN-113522379-A | Micro-wall array and preparation method and application thereof, micro-channel and preparation method thereof, micro-channel reactor and application thereof | 中国科学院化学研究所 | 2021-10-22 | — | — | CN | claimed |
| US-5252431-A | Light sensitive layer and silicone rubber layer; spraying pressurized liquid on the surface to remove the rubber layer | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-12 | — | — | US | claimed |
| EP-0475384-A1 | Spray development process | Fuji Photo Film Co., Ltd. (JP) | 1992-03-18 | — | — | EP | claimed |
| EP-0441502-A2 | Lithographic plate finisher | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-14 | — | — | EP | claimed |
| EP-0418870-A2 | Radiation sensitive polymer composition | TORAY INDUSTRIES, INC. (JP) | 1991-03-27 | — | — | EP | claimed |
| US-4985077-A | WATER SOLUBLE DYE, SOLVENTS, WATER, BENZYL ETHER | TAIHO INDUSTRIES CO., LTD. (JP) | 1991-01-15 | — | — | US | claimed |
| EP-0405986-A2 | method of processing presensitized lithographic printing plate | KONICA CORPORATION (JP) | 1991-01-02 | — | — | EP | claimed |
| US-4959296-A | PRESENSITIZED, POOR WATER SOLUBLE SOLVENT, SURFACTANT | FUJI PHOTO FILM CO., LTD. (JP) | 1990-09-25 | — | — | US | claimed |
| EP-0336400-A2 | Developer for dry ps plates | FUJI PHOTO FILM CO., LTD. (JP) | 1989-10-11 | — | — | EP | claimed |
| EP-0320945-A2 | Process for the development of dry PS plates | FUJI PHOTO FILM CO., LTD. (JP) | 1989-06-21 | — | — | EP | claimed |
| US-4576743-A | Plate cleaner for lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1986-03-18 | — | — | US | claimed |