SCHEMBL130480

SCHEMBL130480

N=C(N)N1C(=O)CC1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11785351 0.83 TSHR (0.31)
SCHEMBL10655517 0.74
SCHEMBL15017150 0.67 F2 (0.31)
SCHEMBL17224707 0.63
SCHEMBL133750 0.61
SCHEMBL19790028 0.59
SCHEMBL1318400 0.59
SCHEMBL21611711 0.59
SCHEMBL727395 0.57 TSHR (0.37)
SCHEMBL8500805 0.57 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4347310-A INCREASED PHOTOSENZITIVITY USING GUANIDINE DERIVTIVES AS SENSITIZERS; PHOTOSTABILITY; STORAGE STABILITY ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-08-31 US claimed
CN-106947211-B Granular composition for polyacetal resin and polyacetal resin composition 旭化成株式会社 2020-01-07 CN disclosed
CN-106905544-B Manufacturing method, polyacetal resin composite particle and the formed body of polyacetals 旭化成株式会社 2019-08-23 CN disclosed
CN-105602188-B The manufacture method of Copolyacetal 旭化成株式会社 2018-01-12 CN disclosed
CN-106947211-A Polyacetal resin granular composition and polyacetal resin composite 旭化成株式会社 2017-07-14 CN disclosed
CN-106905544-A The manufacture method of polyacetals, polyacetal resin composite particle and formed body 旭化成株式会社 2017-06-30 CN disclosed
CN-105602188-A Method of manufacturing polyacetal copolymer ASAHI KASEI CHEMICALS CORP 2016-05-25 CN disclosed
EP-1674526-B9 POLYACETAL RESIN COMPOSITION POLYPLASTICS CO (JP) 2013-05-29 EP disclosed
EP-1674526-B1 POLYACETAL RESIN COMPOSITION POLYPLASTICS CO (JP) 2012-12-05 EP disclosed
EP-1679346-B1 POLYACETAL RESIN COMPOSITION POLYPLASTICS CO (JP) 2012-11-14 EP disclosed
US-20040266916-A1 Flame-retardant resin composition POLYPLASTICS CO., LTD. (JP) 2004-12-30 US disclosed
EP-1452567-A1 FLAME-RETARDANT RESIN COMPOSITION Polyplastics Co Ltd (JP) 2004-09-01 EP disclosed
US-6753363-B1 BASIC NITROGEN-CONTAINING COMPOUND, PHOSPHORUS COMPOUND FLAME RETARDANT, AND AROMATIC COMPOUND ACCELERATOR; MOLDABILITY POLYPLASTICS CO., LTD. (JP) 2004-06-22 US disclosed
EP-0329170-B1 Process for producing 2-amino-4,6-dichloropyrimidine ISHIHARA SANGYO KAISHA (JP) 1995-06-21 EP disclosed
CN-1019575-B Production method of 2-amino-4, 6-dichloropyrimidine ISHIHARA SANGYO KAISHA (JP) 1992-12-23 CN disclosed
US-4929729-A REACTION WITH PHOSPHOROUS OXYCHLORIDE, HYDROLYSIS, CHLORINATION ISHIHARA SANGYO KAISHA LTD. (JP) 1990-05-29 US disclosed
CN-1035504-A 2-amino-4, the production method of 6-dichloro pyrimidine ISHIHARA SANGYO KAISHA (JP) 1989-09-13 CN disclosed
EP-0329170-A2 Process for producing 2-amino-4,6-dichloropyrimidine ISHIHARA SANGYO KAISHA, LTD. (JP) 1989-08-23 EP disclosed
US-4347310-A INCREASED PHOTOSENZITIVITY USING GUANIDINE DERIVTIVES AS SENSITIZERS; PHOTOSTABILITY; STORAGE STABILITY ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1982-08-31 US disclosed
US-4083899-A Accelerated process of alcoholysis or phenolysis of phosporus pentasulfide PRODUITS CHIMIQUES UGINE KUHLMANN (FR) 1978-04-11 US disclosed