SCHEMBL13052283

SCHEMBL13052283

C=CCn1c(=O)n(C)c(=O)n(C(C)O)c1=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.48
GAA P10253 1/20 0.42
NPSR1 Q6W5P4 1/20 0.40
ADORA2B P29275 4/20 0.37
ALDH1A1 P00352 2/20 0.37
USP2 O75604 1/20 0.36
MAPT P10636 2/20 0.36
KDM4E B2RXH2 1/20 0.36
THRB P10828 1/20 0.36
HPGD P15428 1/20 0.36
BLM P54132 1/20 0.36
HSD17B10 Q99714 1/20 0.36
RCE1 Q9Y256 1/20 0.36
PLA2G4A P47712 1/20 0.34
LMNA P02545 1/20 0.34
HTT P42858 1/20 0.34
PDE4A P27815 1/20 0.33
ADORA2A P29274 1/20 0.33
PDE4B Q07343 1/20 0.33
PDE4C Q08493 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13775112 0.80 CYP3A4 (0.68) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL713076 0.80 CYP3A4 (0.76) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL24495805 0.78 CYP3A4 (0.55) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL25588847 0.76 CYP3A4 (0.48) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL14037107 0.75 ADORA2B (0.32) ADORA2B
SCHEMBL24118573 0.74 CYP3A4 (0.67) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL19498758 0.74 CYP3A4 (0.67) CYP3A4GAANPSR1ADORA2BUSP2
SCHEMBL15946190 0.74 CYP3A4 (0.50) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL12999576 0.73 CYP3A4 (0.48) CYP3A4GAANPSR1ADORA2BALDH1A1
SCHEMBL16864614 0.73 CYP3A4 (0.64) CYP3A4GAANPSR1ADORA2BALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100304305-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-02 US disclosed