⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL9065506 | 1.00 | — | — | |
| Tetramethylammonium Ion SCHEMBL8986237 | 1.00 | CHRNB2 (0.80) | — | |
| Tetramethylammonium Ion SCHEMBL11805073 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL11805069 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL20994804 | 0.91 | — | — | |
| Tetramethylammonium Ion SCHEMBL12020273 | 0.89 | — | — | |
| Tetramethylammonium Ion SCHEMBL4079605 | 0.89 | — | — | |
| Tetramethylammonium Ion SCHEMBL16825 | 0.89 | — | — | |
| Tetramethylammonium Ion SCHEMBL5493227 | 0.89 | — | — | |
| Tetramethylammonium Ion SCHEMBL25218094 | 0.80 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105452261-A | Continuous process for the preparation of thiocarboxylate silane | MOMENTIVE PERFORMANCE MAT INC | 2016-03-30 | — | — | CN | disclosed |
| US-8053179-B2 | Monomolecular silicon oxide film for immobilizing a target molecule can be simply formed position-selectively in manufacture; use of a chemically amplified positive resist of a copolymer where a content of hydroxyl group-containing monomer is 5 % or less which is patterned and later removed | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-11-08 | — | — | US | disclosed |
| EP-1862855-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2011-10-05 | — | — | EP | disclosed |
| US-7977400-B2 | polyimide, unsaturated polymerizable compound, photoinitiator; crosslinkable to form addition-condensation copolymer or polyetherimide copolymer; no imidation of polymer through high-temperature heat treatment; alkaline development; polyimide film having excellent heat resistance, strength, elongation | TORAY INDUSTRIES, INC. (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20080233521-A1 | Method for manufacturing substrate for making microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080108723-A1 | Photosensitive Resin Composition | TORAY INDUSTRIES, INC. (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-1862855-A1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2007-12-05 | — | — | EP | disclosed |
| CN-1246435-C | Bleach catalysts with unsaturated surfactants and antioxidants | UNILEVER NV (NL) | 2006-03-22 | — | — | CN | disclosed |
| CN-1496399-A | Bleaching catalysts with unsaturated surfactant and antioxidant | — | 2004-05-12 | — | — | CN | disclosed |