SCHEMBL13055403

SCHEMBL13055403

CC(C)(C)OC(=O)NCCN(CCNC(=O)OC(C)(C)C)C(=O)OC(C)(C)C

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA14 Q9ULX7 2/20 0.54
TDP1 Q9NUW8 1/20 0.51
MEN1 O00255 1/20 0.49
GAA P10253 1/20 0.49
KMT2A Q03164 1/20 0.49
CA12 O43570 7/20 0.46
CA1 P00915 7/20 0.46
CA2 P00918 6/20 0.46
CA9 Q16790 6/20 0.46
MAOA P21397 1/20 0.45
MAOB P27338 1/20 0.45
CKS1B P61024 1/20 0.43
SKP1 P63208 1/20 0.43
SKP2 Q13309 1/20 0.43
EPHX1 P07099 1/20 0.43
CA7 P43166 1/20 0.40
HTT P42858 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
NQO2 P16083 1/20 0.39
STK17B O94768 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13055414 0.98 CA14 (0.53) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055399 0.98 CA14 (0.53) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055411 0.98 CA14 (0.53) CA14TDP1MEN1GAAKMT2A
SCHEMBL13055400 0.93 CA14 (0.64) CA14TDP1MEN1GAAKMT2A
SCHEMBL6753294 0.93 TDP1 (0.54) CA14TDP1MEN1GAAKMT2A
SCHEMBL24521650 0.93 CA14 (0.49) CA14TDP1MEN1GAAKMT2A
SCHEMBL8020881 0.93 CA14 (0.60) CA14TDP1MEN1GAAKMT2A
SCHEMBL568570 0.92 CA14 (0.48) CA14TDP1MEN1GAAKMT2A
SCHEMBL4195737 0.92 CA14 (0.48) CA14TDP1MEN1GAAKMT2A
SCHEMBL29290727 0.92 CA14 (0.48) CA14TDP1MEN1GAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426105-B2 Resist-modifying composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed