SCHEMBL1305709

SCHEMBL1305709

CC1=C([Ca]C2=C(C)C=CC2)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332416 0.85
SCHEMBL216231 0.71
SCHEMBL8162371 0.71
SCHEMBL409596 0.71
SCHEMBL15514653 0.71
SCHEMBL7263423 0.69
SCHEMBL9705999 0.69
SCHEMBL9142119 0.69
SCHEMBL9299246 0.69
SCHEMBL4255848 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8053811-B2 Group 3-5 nitride semiconductor multilayer substrate, method for manufacturing group 3-5 nitride semiconductor free-standing subtrate, and semiconductor element SUMITOMO CHEMICAL COMPANY LIMITED (JP) 2011-11-08 US disclosed
US-20090117675-A1 Method for Producing Group 3-5 Nitride Semiconductor and Method for Producing Light-Emitting Device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-05-07 US disclosed
US-20090085165-A1 Group 3-5 Nitride Semiconductor Multilayer Substrate, Method for Manufacturing Group 3-5 Nitride Semiconductor Free-Standing Subtrate, and Semiconductor Element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-04-02 US disclosed
US-20090008652-A1 Free-Standing Substrate, Method for Producing the Same and Semiconductor Light-Emitting Device SUMITOMO CHEMICAL COMPANY, LTD. (JP) 2009-01-08 US disclosed
US-20090008745-A1 Nitride Compound Semiconductor and Process for Producing the Same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-01-08 US disclosed