⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL409596 | 0.71 | — | — | |
| SCHEMBL216231 | 0.71 | — | — | |
| SCHEMBL8162371 | 0.71 | — | — | |
| SCHEMBL4901878 | 0.69 | — | — | |
| SCHEMBL7263423 | 0.69 | — | — | |
| SCHEMBL9705999 | 0.69 | — | — | |
| SCHEMBL9142119 | 0.69 | — | — | |
| SCHEMBL1305709 | 0.69 | — | — | |
| SCHEMBL9299246 | 0.69 | — | — | |
| SCHEMBL17581083 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240218503-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2024-07-04 | — | — | US | claimed |
| US-11959167-B2 | Selective cobalt deposition on copper surfaces | APPLIED MATERIALS, INC. (US) | 2024-04-16 | — | — | US | claimed |
| US-20220298625-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2022-09-22 | — | — | US | claimed |
| US-11384429-B2 | Selective cobalt deposition on copper surfaces | APPLIED MATERIALS, INC. (US) | 2022-07-12 | — | — | US | claimed |
| CN-101466863-B | Process for forming cobalt-containing materials | APPLIED MATERIALS INC | 2011-08-10 | — | — | CN | claimed |
| CN-101466863-A | Process for forming cobalt-containing materials | APPLIED MATERIALS INC (US) | 2009-06-24 | — | — | CN | claimed |
| US-12564025-B2 | Interconnect with redeposited metal capping and method forming same | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-02-24 | — | — | US | disclosed |
| CN-119306773-A | Novel asymmetric metallocene metal complex and preparation method thereof | 苏州源展材料科技有限公司 | 2025-01-14 | — | — | CN | disclosed |
| US-20240218503-A1 | SELECTIVE COBALT DEPOSITION ON COPPER SURFACES | APPLIED MATERIALS, INC. | 2024-07-04 | — | — | US | disclosed |
| US-20240213088-A1 | SUBTRACTIVE METALS AND SUBTRACTIVE METAL SEMICONDUCTOR STRUCTURES | APPLIED MATERIALS, INC. | 2024-06-27 | — | — | US | disclosed |
| US-11990368-B2 | Doped selective metal caps to improve copper electromigration with ruthenium liner | APPLIED MATERIALS, INC. (US) | 2024-05-21 | — | — | US | disclosed |
| US-11959167-B2 | Selective cobalt deposition on copper surfaces | APPLIED MATERIALS, INC. (US) | 2024-04-16 | — | — | US | disclosed |
| US-11923244-B2 | Subtractive metals and subtractive metal semiconductor structures | APPLIED MATERIALS, INC. (US) | 2024-03-05 | — | — | US | disclosed |
| WO-2009134916-A2 | PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS | APPLIED MATERIALS, INC. (US) | 2009-11-05 | — | — | WO | disclosed |
| CN-101466863-A | Process for forming cobalt-containing materials | APPLIED MATERIALS INC (US) | 2009-06-24 | — | — | CN | disclosed |
| CN-101414557-A | Plasma surface treatment for Si and metal nanocrystal nucleation | APPLIED MATERIALS INC (US) | 2009-04-22 | — | — | CN | disclosed |
| CN-101365821-A | Method for depositing metallic film | JSR CORP (JP) | 2009-02-11 | — | — | CN | disclosed |
| CN-100423199-C | Composition for forming silicon-cobalt film, silicon-cobalt film, and forming method therefor | JSR CORP (JP) | 2008-10-01 | — | — | CN | disclosed |
| CN-1868037-A | Composition for forming silicon-cobalt film, silicon-cobalt film, and forming method therefor | JSR CORP (JP) | 2006-11-22 | — | — | CN | disclosed |
| EP-0110177-B1 | SUBSTITUTED CYCLOPENTADIENYL COBALT COMPLEXES AND SYNTHESIS OF PYRIDINE HOMOLOGUES BY MEANS OF THE COMPLEXES | DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1989-03-22 | — | — | EP | disclosed |