SCHEMBL1311046

SCHEMBL1311046

C[S+](C)CCC(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bromide SCHEMBL393964 0.97
Hydrochloric Acid SCHEMBL3767981 0.97
Sulfuric Acid SCHEMBL6702855 0.87 APEX1 (0.39)
Sulfuric Acid SCHEMBL6702860 0.85 APEX1 (0.37)
SCHEMBL9636966 0.82
SCHEMBL9635529 0.80 LMNA (0.58)
SCHEMBL9635507 0.78 TSHR (0.60)
SCHEMBL186925 0.77
Barium SCHEMBL30984639 0.75
Calcium SCHEMBL30984640 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5139791-A Sulfonium salts Nakajima, Kenji (JP) 1992-08-18 US claimed
JP-4054120-A None JP disclosed
JP-3027231-A None JP disclosed
WO-2026100367-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD 東京応化工業株式会社 2026-05-15 WO disclosed
US-20260118757-A1 RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-04-30 US disclosed
EP-4722811-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2026-04-08 EP disclosed
EP-4722810-A1 RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE Tokyo Ohka Kogyo Co., Ltd. (JP) 2026-04-08 EP disclosed
EP-4722814-A1 PATTERN FORMING METHOD AND PROCESSING LIQUID FOR METAL COMPOUND-CONTAINING FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2026-04-08 EP disclosed
EP-4674837-A1 HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE Tokyo Ohka Kogyo Co., Ltd. (JP) 2026-01-07 EP disclosed
EP-4635963-A1 ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE TOKYO OHKA KOGYO CO., LTD. (JP) 2025-10-22 EP disclosed
US-20110152561-A1 METHOD FOR PRODUCTION OF N-CARBOXY AMINO ACID ANHYDRIDE AND AMINO ACID CARBAMATE COMPOUND JSR CORPORATION (JP) 2011-06-23 US disclosed
US-20110118165-A1 COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SUBSTRATE SURFACE Lee, Wai Mun (US) 2011-05-19 US disclosed
EP-2322515-A1 N-CARBOXY AMINO ACID ANHYDRIDE AND AMINO ACID CARBAMATE COMPOUND PRODUCTION METHOD JSR Corporation (JP) 2011-05-18 EP disclosed
US-20100267857-A1 SALT COMPOUND, CATIONIC POLYMERIZATION INITIATOR AND CATIONICALLY POLYMERIZABLE COMPOSITION ADEKA CORPORATION (JP) 2010-10-21 US disclosed
US-20100113728-A1 POLYOLEFIN POLYMER HAVING POLAR GROUP, METHOD FOR PRODUCTION THEREOF, AND WATER DISPERSION MATERIAL AND MOLD RELEASE AGENT COMPOSITION MITSUI CHEMICALS, INC. 2010-05-06 US disclosed
US-20100092869-A1 LITHIUM ION BATTERY NEC TOKIN CORPORATION (JP) 2010-04-15 US disclosed
EP-2166027-A1 POLYOLEFIN POLYMER HAVING POLAR GROUP, METHOD FOR PRODUCTION THEREOF, AND WATER DISPERSION MATERIAL AND MOLD RELEASE AGENT COMPOSITION Mitsui Chemicals, Inc. (JP) 2010-03-24 EP disclosed
US-5139791-A Sulfonium salts Nakajima, Kenji (JP) 1992-08-18 US disclosed
JP-H0454120-A PREVENTIVE AND REMEDY FOR ULCERS NIPPON OIL & FATS CO LTD 1992-02-21 JP disclosed
JP-H0327231-A FISHING BAIT AND PRODUCTION THEREOF NAKAJIMA KENJI 1991-02-05 JP disclosed