SCHEMBL13136802

SCHEMBL13136802

CC(C)CC(CC(C)C)OC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)cc1

nearest known ligand 0.38

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
STS P08842 10/20 0.38
CXCR2 P25025 2/20 0.34
RAB9A P51151 1/20 0.33
CXCR1 P25024 1/20 0.33
CA12 O43570 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
PPARG P37231 1/20 0.32
HPGD P15428 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
CA7 P43166 1/20 0.32
CA14 Q9ULX7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9966140 0.80 STS (0.55) STSRAB9ACA12CA1CA2
SCHEMBL20323213 0.80 CXCR2 (0.38) CXCR2CXCR1
SCHEMBL10204866 0.79 STS (0.34) STSCXCR2RAB9ACXCR1CA12
SCHEMBL10233233 0.79 ELANE (0.34) STSCXCR2RAB9ACXCR1CA12
SCHEMBL2886986 0.79 STS (0.33) STSCXCR2RAB9ACXCR1CA12
SCHEMBL25470385 0.79 STS (0.39) STSCXCR2RAB9ACXCR1
SCHEMBL16638150 0.76 STS (0.44) STSRAB9ACA12CA1CA2
SCHEMBL9963743 0.76 STS (0.36) STSRAB9ACA12CA1CA2
SCHEMBL9966126 0.76 STS (0.31) STSCXCR2RAB9ACXCR1
SCHEMBL9966114 0.76 KMT2A (0.43) STSRAB9ACA1CA2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7803511-B2 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJIFILM CORPORATION (JP) 2010-09-28 US disclosed
US-7803511-B2 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJIFILM CORPORATION (JP) 2010-09-28 US disclosed
US-20070042290-A1 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed
US-20070042290-A1 resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits FUJI PHOTO FILM CO., LTD. 2007-02-22 US disclosed