⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1317936 | 0.83 | TSHR (0.38) | — | |
| SCHEMBL5483351 | 0.79 | TSHR (0.42) | — | |
| SCHEMBL1315871 | 0.79 | TSHR (0.42) | — | |
| SCHEMBL1067717 | 0.77 | — | — | |
| SCHEMBL1314505 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL6936509 | 0.75 | — | — | |
| SCHEMBL1317755 | 0.74 | — | — | |
| SCHEMBL21383294 | 0.72 | — | — | |
| SCHEMBL2269602 | 0.72 | — | — | |
| SCHEMBL3481505 | 0.71 | TSHR (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8163950-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110275849-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2011-11-10 | — | — | US | disclosed |
| US-8008521-B2 | Processes for the production of tri-organo-monoalkoxysilanes and process for the production of tri-organo-monochlorosilanes | HOKKO CHEMICAL INDUSTRY CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| CN-1837221-B | Production processes for triorganomonochlorosilanes | HOKKO CHEM IND CO | 2011-06-08 | — | — | CN | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20090082585-A1 | PROCESSES FOR THE PRODUCTION OF TRI-ORGANO-MONOALKOXYSILANES AND PROCESS FOR THE PRODUCTION OF TRI-ORGANO-MONOCHLOROSILANES | BANNOU TADASHI | 2009-03-26 | — | — | US | disclosed |
| US-7459577-B2 | Reacting a chlorosilane with grignard reagent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-12-02 | — | — | US | disclosed |
| CN-1296374-C | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2007-01-24 | — | — | CN | disclosed |
| CN-1837221-A | Production processes for triorganomonochlorosilanes | HOKKO CHEM IND CO (JP) | 2006-09-27 | — | — | CN | disclosed |
| CN-1612886-A | Method for producing triorgano-monoalkoxysilanes and method for producing triorgano-monochlorosilanes | HOKKO CHEM IND CO (JP) | 2005-05-04 | — | — | CN | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |