SCHEMBL13159969

SCHEMBL13159969

COC(=O)c1c(-c2ccccc2)nn(C)c1/N=N/c1c(C)nn(-c2cc(-n3nc(C)c(/N=N/c4c(C(=O)C=O)c(-c5ccccc5)nn4C)c3N)ncn2)c1N

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SLC34A1 Q06495 11/20 0.40
▸ TP53 P04637 2/20 0.40
▸ LMNA P02545 1/20 0.40
▸ HPGD P15428 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ NPC1 O15118 2/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ RAB9A P51151 2/20 0.37
▸ MAPT P10636 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.34
▸ GABRP O00591 1/20 0.34
▸ GABRD O14764 1/20 0.34
▸ GABRA1 P14867 1/20 0.34
▸ GABRB1 P18505 1/20 0.34
▸ GABRG2 P18507 1/20 0.34
▸ GABRB3 P28472 1/20 0.34
▸ GABRA5 P31644 1/20 0.34
▸ GABRA3 P34903 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10454068 0.95 TP53 (0.44) SLC34A1TP53LMNAHPGDMEN1
SCHEMBL13159971 0.90 MAPT (0.38) SLC34A1TP53LMNAHPGDNPC1
SCHEMBL9972779 0.90 SLC34A1 (0.41) SLC34A1TP53LMNAHPGDMEN1
SCHEMBL13159982 0.87 HPGD (0.38) SLC34A1LMNAHPGDNPC1ALDH1A1
SCHEMBL10454081 0.84 MAPT (0.41) SLC34A1TP53LMNAHPGDMEN1
SCHEMBL13159980 0.83 GABRP (0.35) LMNAHPGDNPC1ALDH1A1RAB9A
SCHEMBL10453830 0.82 HPGD (0.41) SLC34A1LMNAHPGDNPC1ALDH1A1
SCHEMBL14845513 0.82 TP53 (0.39) SLC34A1TP53LMNAMEN1KMT2A
SCHEMBL9972781 0.80 MAPT (0.37) SLC34A1TP53LMNAHPGDNPC1
SCHEMBL13159981 0.79 NPC1 (0.46) SLC34A1TP53LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8426495-B2 Radiation-curable ink composition for inkjet recording, inkjet recording method, and printed matter FUJIFILM CORPORATION (JP) 2013-04-23 — — US disclosed
US-20100221507-A1 RADIATION-CURABLE INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD, AND PRINTED MATTER FUJIFILM CORPORATION (JP) 2010-09-02 — — US disclosed
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