⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12246838 | 0.79 | KMT2A (0.38) | — | |
| SCHEMBL12246837 | 0.79 | KMT2A (0.38) | — | |
| SCHEMBL12246839 | 0.79 | KMT2A (0.38) | — | |
| SCHEMBL2154209 | 0.79 | KMT2A (0.38) | — | |
| SCHEMBL19821466 | 0.70 | — | — | |
| SCHEMBL21337968 | 0.70 | KMT2A (0.32) | — | |
| SCHEMBL19881045 | 0.67 | KMT2A (0.31) | — | |
| SCHEMBL1164553 | 0.64 | KDM4E (0.34) | — | |
| SCHEMBL6618 | 0.64 | — | — | |
| SCHEMBL1343696 | 0.64 | KDM4E (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100247867-A1 | RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE, AND METHOD FOR MANUFACTURING RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |