SCHEMBL13198601

SCHEMBL13198601

C=CCn1c(=O)n(CC=C)c(=O)n(CCCCCCCC)c1=O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.59
NPSR1 Q6W5P4 1/20 0.51
HTT P42858 2/20 0.43
TSHR P16473 2/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
GALR3 O60755 1/20 0.43
LMNA P02545 1/20 0.43
MAPK1 P28482 1/20 0.43
RAB9A P51151 1/20 0.43
KDM4E B2RXH2 1/20 0.43
ALDH1A1 P00352 1/20 0.43
ADORA2B P29275 4/20 0.42
PDE4A P27815 2/20 0.42
ADORA2A P29274 2/20 0.42
PDE4B Q07343 2/20 0.42
PDE4C Q08493 2/20 0.42
PDE4D Q08499 2/20 0.42
USP2 O75604 2/20 0.42
HSD17B10 Q99714 1/20 0.42
PTGS1 P23219 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4112389 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL4126032 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL11357417 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL4106817 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL13198600 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL4117807 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL25388740 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL17145006 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL20737983 1.00 CYP3A4 (0.59) CYP3A4NPSR1HTTTSHRSMN1; SMN2
SCHEMBL13198597 0.98 CYP3A4 (0.61) CYP3A4NPSR1HTTTSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023210567-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL FOIL CLAD LAMINATED PLATE, RESIN COMPOSITE SHEET, PRINTED WIRING BOARD, SEMICONDUCTOR DEVICE, AND PRINTED WIRING BOARD MANUFACTURING METHOD 三菱瓦斯化学株式会社 2023-11-02 WO disclosed
WO-2023176765-A1 HYDROXY RESIN, STYRENE RESIN, METHOD FOR PRODUCING HYDROXY RESIN, METHOD FOR PRODUCING STYRENE RESIN, AND APPLICATIONS THEREOF 三菱瓦斯化学株式会社 2023-09-21 WO disclosed
WO-2023176764-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-09-21 WO disclosed
WO-2023176763-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL-FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, PRINTED CIRCUIT BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-09-21 WO disclosed
WO-2023176766-A1 RESIN, RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-09-21 WO disclosed
WO-2023171554-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL-FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, PRINTED CIRCUIT BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-09-14 WO disclosed
WO-2023171553-A1 RESIN COMPOSITION, CURED PRODUCT, PREPREG, METAL-FOIL-CLAD LAMINATE, RESIN COMPOSITE SHEET, PRINTED CIRCUIT BOARD, AND SEMICONDUCTOR DEVICE 三菱瓦斯化学株式会社 2023-09-14 WO disclosed
CN-115916535-A Resin composition, prepreg using same, resin-containing film, resin-containing metal foil, metal-clad laminate, and wiring board 松下知识产权经营株式会社 2023-04-04 CN disclosed
US-10788750-B2 Photosensitive resin composition, cured film, laminate, touch panel member, and method for manufacturing cured film TORAY INDUSTRIES, INC. (JP) 2020-09-29 US disclosed
US-20190049840-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, TOUCH PANEL MEMBER, AND METHOD FOR MANUFACTURING CURED FILM TORAY INDUSTRIES, INC. (JP) 2019-02-14 US disclosed
WO-2015149222-A1 CROSSLINKABLE POLYMERIC COMPOSITIONS WITH DIALLYL ISOCYANURATE CROSSLINKING COAGENTS, METHODS FOR MAKING THE SAME, AND ARTICLES MADE THEREFROM DOW GLOBAL TECHNOLOGIES LLC (US) 2015-10-08 WO disclosed
US-7785715-B2 Compound with at least two carbon-carbon double bonds such as triallyl isocyanurate; compound with SiH groups such as reaction product of 1,3,5,7 tetramethylcyclotetrasiloxane and triallyl isocyanurate; coupler; and not less than 5% by weight of rutile TiO2 KANEKA CORPORATION (JP) 2010-08-31 US disclosed
US-7785715-B2 Compound with at least two carbon-carbon double bonds such as triallyl isocyanurate; compound with SiH groups such as reaction product of 1,3,5,7 tetramethylcyclotetrasiloxane and triallyl isocyanurate; coupler; and not less than 5% by weight of rutile TiO2 KANEKA CORPORATION (JP) 2010-08-31 US disclosed
US-7371462-B2 1,3,5,7-tetramethylcyclotetrasiloxane and triallyl isocyanurate, a hydrosilylation catalyst, a silane coupling agent and/or an epoxy group-containing compound, and a silanol condensation catalyst KANEKA CORPORATION (JP) 2008-05-13 US disclosed
US-7371462-B2 1,3,5,7-tetramethylcyclotetrasiloxane and triallyl isocyanurate, a hydrosilylation catalyst, a silane coupling agent and/or an epoxy group-containing compound, and a silanol condensation catalyst KANEKA CORPORATION (JP) 2008-05-13 US disclosed