SCHEMBL1319976

SCHEMBL1319976

NCCCCCCCCS(=O)(=O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 8/20 0.38
CA1 P00915 5/20 0.38
CA12 O43570 4/20 0.38
CA9 Q16790 4/20 0.38
CA7 P43166 3/20 0.38
LMNA P02545 3/20 0.38
DNM1 Q05193 3/20 0.38
CA3 P07451 2/20 0.38
CA4 P22748 2/20 0.38
CA6 P23280 2/20 0.38
CA5A P35218 2/20 0.38
CA14 Q9ULX7 2/20 0.38
CA5B Q9Y2D0 2/20 0.38
TSHR P16473 2/20 0.38
BLM P54132 1/20 0.38
APP P05067 1/20 0.37
ALDH1A1 P00352 2/20 0.36
GMNN O75496 1/20 0.36
TP53 P04637 1/20 0.36
MAPK1 P28482 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1318325 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1319859 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1321629 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1321107 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1318735 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1320930 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1319037 1.00 CA2 (0.38) CA2CA1CA12CA9CA7
SCHEMBL1320402 0.98 APP (0.39) CA2CA1CA12CA9CA7
SCHEMBL5457097 0.87 CA2 (0.37) CA2CA1CA7ALDH1A1MAPK1
SCHEMBL17092516 0.87 CA2 (0.37) CA2CA1CA7ALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8057981-B2 Resist composition, resist protective coating composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-15 US disclosed
US-7759047-B2 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-07-20 US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed