SCHEMBL13202802

SCHEMBL13202802

C=C(OCCO)C(C)(C)CC(C)(CC(C)(CC)C(=O)OCc1ccccc1)C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.36
PPARG P37231 1/20 0.35
PPARD Q03181 1/20 0.35
PPARA Q07869 1/20 0.35
MAPK1 P28482 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
CYP3A4 P08684 1/20 0.34
TSHR P16473 1/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
LMNA P02545 1/20 0.34
PTPN1 P18031 3/20 0.33
PTPRC P08575 1/20 0.33
KMT2A Q03164 3/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A3 Q01959 1/20 0.33
MEN1 O00255 2/20 0.32
RIPK1 Q13546 1/20 0.32
SYK P43405 1/20 0.32
PRKCA P17252 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12411572 0.90 ALDH1A1 (0.38) ALDH1A1PPARGPPARDPPARAMAPK1
SCHEMBL14448187 0.86 ALDH1A1 (0.39) ALDH1A1PPARGPPARDPPARAMAPK1
SCHEMBL732790 0.85 ALDH1A1 (0.38) ALDH1A1PPARGPPARDPPARAMAPK1
SCHEMBL13108658 0.85 ALDH1A1 (0.42) ALDH1A1MAPK1TDP1L3MBTL1CYP3A4
SCHEMBL9880804 0.82 KMT2A (0.43) ALDH1A1MAPK1TDP1L3MBTL1SMN1; SMN2
SCHEMBL25130150 0.81 ALDH1A1 (0.47) ALDH1A1MAPK1TDP1L3MBTL1CYP3A4
SCHEMBL16706567 0.80 ALDH1A1 (0.46) ALDH1A1MAPK1TDP1L3MBTL1CYP3A4
SCHEMBL16706570 0.80 ALDH1A1 (0.46) ALDH1A1MAPK1TDP1L3MBTL1CYP3A4
SCHEMBL733325 0.78 ALDH1A1 (0.47) ALDH1A1PPARGPPARDPPARAMAPK1
SCHEMBL10033038 0.78 KMT2A (0.44) ALDH1A1MAPK1TDP1L3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7781153-B2 Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-08-24 US disclosed
US-20070249117-A1 Polymer resin composition, related method for forming a pattern, and related method for fabricating a capacitor SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-10-25 US disclosed