Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL132884 | 0.91 | CYP1A2 (0.31) | — | |
| SCHEMBL13607370 | 0.86 | — | — | |
| SCHEMBL132093 | 0.86 | KDM4E (0.36) | KDM4ECYP2C9CYP2C19 | |
| SCHEMBL16900294 | 0.84 | KDM4E (0.37) | KDM4E | |
| SCHEMBL17539211 | 0.83 | — | — | |
| SCHEMBL17532395 | 0.83 | — | — | |
| SCHEMBL16900293 | 0.83 | HMGCR (0.30) | HMGCR | |
| SCHEMBL12202235 | 0.83 | HMGCR (0.32) | HMGCR | |
| SCHEMBL47494 | 0.83 | HMGCR (0.32) | HMGCR | |
| SCHEMBL15473008 | 0.82 | CYP1A2 (0.39) | HMGCRKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052594-B2 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-9017931-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-28 | — | — | US | disclosed |
| US-20140051026-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-20 | — | — | US | disclosed |
| US-20120058431-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |