Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.31 |
| ▸ | AQP3 | Q92482 | 1/20 | 0.31 |
| ▸ | LIPA | P38571 | 1/20 | 0.30 |
| ▸ | AQP1 | P29972 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16900294 | 0.89 | KDM4E (0.37) | KDM4EGAA | |
| SCHEMBL17532395 | 0.88 | — | — | |
| SCHEMBL132094 | 0.86 | HMGCR (0.32) | KDM4ECYP2C9CYP2C19 | |
| SCHEMBL13607370 | 0.85 | — | — | |
| SCHEMBL20484024 | 0.83 | ALDH1A1 (0.39) | KDM4EALDH1A1LMNACYP1A2CYP3A4 | |
| SCHEMBL16900289 | 0.83 | KDM4E (0.34) | KDM4EALDH1A1LMNACYP1A2CYP3A4 | |
| SCHEMBL20484026 | 0.82 | ALDH1A1 (0.39) | KDM4EALDH1A1LMNACYP1A2CYP3A4 | |
| SCHEMBL17539211 | 0.82 | — | — | |
| SCHEMBL16900293 | 0.82 | HMGCR (0.30) | — | |
| SCHEMBL47494 | 0.82 | HMGCR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122152-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICALS CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| US-9081290-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-14 | — | — | US | disclosed |
| US-9052594-B2 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20120058431-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |