SCHEMBL13216611

SCHEMBL13216611

O=C(O)[C@@H]1C2CC(C3CCCC32)[C@@H]1C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.46
TDP1 Q9NUW8 2/20 0.46
KDM4E B2RXH2 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
LMNA P02545 3/20 0.39
PMP22 Q01453 2/20 0.39
TSHR P16473 2/20 0.39
APEX1 P27695 1/20 0.39
GMNN O75496 1/20 0.39
TFPI2 P48307 1/20 0.39
TP53 P04637 1/20 0.39
NFKB1 P19838 1/20 0.39
THPO P40225 1/20 0.39
MAPK1 P28482 1/20 0.36
GRM8 O00222 2/20 0.33
GRM2 Q14416 2/20 0.33
GRM3 Q14832 2/20 0.33
GRM6 O15303 1/20 0.33
GRM4 Q14833 1/20 0.32
HSD11B1 P28845 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7518390 1.00 POLB (0.46) POLBTDP1KDM4EL3MBTL1LMNA
SCHEMBL3025350 1.00 POLB (0.46) POLBTDP1KDM4EL3MBTL1LMNA
SCHEMBL3981109 0.85 POLB (0.43) POLBTDP1KDM4EL3MBTL1LMNA
SCHEMBL3984100 0.85 POLB (0.43) POLBTDP1KDM4EL3MBTL1LMNA
SCHEMBL14357831 0.84 PPM1B (0.49) POLBTDP1CYP1A2CYP2C19ALDH1A1
SCHEMBL3983189 0.80
SCHEMBL15369748 0.80
SCHEMBL26077289 0.80
SCHEMBL30978583 0.80
SCHEMBL432536 0.80 POLB (0.57) POLBTDP1KDM4EL3MBTL1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100210765-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-08-19 US disclosed
US-20100210765-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-08-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100210765-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION EXOC1, EPCAM, EXOC4 POLB 1243/4885TDP1 2366/4885KDM4E 747/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.