SCHEMBL1323769

SCHEMBL1323769

CCCNCCN[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6934656 0.83 TSHR (0.50)
SCHEMBL4745526 0.83 TSHR (0.50)
SCHEMBL1003894 0.83 TSHR (0.50)
SCHEMBL54330 0.79
SCHEMBL15445 0.79
SCHEMBL17626634 0.79 TSHR (0.53)
Bromide SCHEMBL28271631 0.76
Iodide SCHEMBL28289332 0.76
Hydrochloric Acid SCHEMBL2784721 0.76
Bromide SCHEMBL6657855 0.76 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3377565-A1 POLYMERIC SUBSTRATE WITH A SURFACE HAVING REDUCED BIOMOLECULE ADHESION, AND THERMOPLASTIC ARTICLES OF SUCH SUBSTRATE SiO2 Medical Products, Inc. (US) 2018-09-26 EP disclosed
US-20180149977-A1 COMPOSITION FOR COATING RESIST PATTERN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-05-31 US disclosed
US-9403932-B2 Process for producing silica-comprising polyol dispersions and their use for producing polyurethane materials BASF SE (DE) 2016-08-02 US disclosed
US-20110266497-A1 PROCESS FOR PRODUCING SILICA-COMPRISING POLYOL DISPERSIONS AND THEIR USE FOR PRODUCING POLYURETHANE MATERIALS BASF SE (DE) 2011-11-03 US disclosed