⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13402439 | 0.88 | HMGCR (0.31) | — | |
| SCHEMBL25516650 | 0.74 | HMGCR (0.37) | — | |
| SCHEMBL13241918 | 0.74 | HMGCR (0.34) | — | |
| SCHEMBL14489286 | 0.69 | FKBP1A (0.43) | — | |
| SCHEMBL15113800 | 0.69 | HMGCR (0.31) | — | |
| SCHEMBL12026692 | 0.69 | HMGCR (0.34) | — | |
| SCHEMBL12116546 | 0.69 | FKBP1A (0.49) | — | |
| SCHEMBL20024446 | 0.69 | HMGCR (0.35) | — | |
| SCHEMBL14094146 | 0.68 | HMGCR (0.32) | — | |
| SCHEMBL12116552 | 0.68 | HMGCR (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8871421-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2014-10-28 | — | — | US | disclosed |
| US-20100183978-A1 | SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN FORMING METHOD USING THE TREATING AGENT | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-7510822-B2 | Stimulation sensitive composition and compound | FUJIFILM CORPORATION (JP) | 2009-03-31 | — | — | US | disclosed |
| US-20070178405-A1 | Positive resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-08-02 | — | — | US | disclosed |