Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRM1 | Q13255 | 6/20 | 0.42 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | CTSV | O60911 | 1/20 | 0.31 |
| ▸ | CTSL | P07711 | 1/20 | 0.31 |
| ▸ | CTSS | P25774 | 1/20 | 0.31 |
| ▸ | CTSK | P43235 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16591707 | 0.97 | GRM1 (0.44) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL13992358 | 0.90 | GRM1 (0.41) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL12081657 | 0.90 | GRM1 (0.41) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL13992314 | 0.87 | GRM1 (0.38) | GRM1ATMCYP19A1CTSVCTSL | |
| SCHEMBL14479488 | 0.84 | ATM (0.46) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL132929 | 0.84 | ATM (0.46) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL13992357 | 0.83 | GRM1 (0.37) | GRM1ATMCYP19A1 | |
| SCHEMBL18233431 | 0.79 | GRM1 (0.33) | GRM1 | |
| SCHEMBL3004503 | 0.77 | ATM (0.47) | GRM1ATMCYP19A1EPHX2CTSV | |
| SCHEMBL132698 | 0.77 | GRM1 (0.38) | GRM1ATMCYP19A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052594-B2 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20120058431-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |