SCHEMBL132698

SCHEMBL132698

CCC(C)(C)C(=O)OC1CC2CCC1CC2

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRM1 Q13255 3/20 0.38
ATM Q13315 1/20 0.37
CYP19A1 P11511 1/20 0.35
EPHX2 P34913 1/20 0.33
GAA P10253 1/20 0.32
ALDH1A1 P00352 2/20 0.32
CYP3A4 P08684 2/20 0.32
SLCO1B1 Q9Y6L6 2/20 0.32
KDM4E B2RXH2 1/20 0.32
USP2 O75604 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
NR1I2 O75469 1/20 0.32
ABCB11 O95342 1/20 0.32
HMGCR P04035 1/20 0.32
NR3C1 P04150 1/20 0.32
PGR P06401 1/20 0.32
ABCB1 P08183 1/20 0.32
ADORA3 P0DMS8 1/20 0.32
CYP2C8 P10632 1/20 0.32
CHRM1 P11229 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL132929 0.92 ATM (0.46) GRM1ATMCYP19A1EPHX2
SCHEMBL14479488 0.92 ATM (0.46) GRM1ATMCYP19A1EPHX2
SCHEMBL17598853 0.85 GRM1 (0.36) GRM1ATMCYP19A1EPHX2ALDH1A1
SCHEMBL16591707 0.79 GRM1 (0.44) GRM1ATMCYP19A1EPHX2
SCHEMBL9916133 0.78 CYP19A1 (0.43) GRM1ATMCYP19A1EPHX2ALDH1A1
SCHEMBL132553 0.77 GRM1 (0.42) GRM1ATMCYP19A1EPHX2
SCHEMBL18922990 0.77 GRM1 (0.40) GRM1ATMCYP19A1EPHX2
SCHEMBL2625613 0.77 GRM1 (0.40) GRM1ATMCYP19A1EPHX2
SCHEMBL20101400 0.77 HMGCR (0.33) HMGCR
SCHEMBL3004503 0.77 ATM (0.47) GRM1ATMCYP19A1EPHX2PDE4D

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-7776512-B2 Positive photosensitive composition FUJIFILM CORPORATION (JP) 2010-08-17 US disclosed
US-20100203445-A1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-08-12 US disclosed
US-20090148791-A1 POSITIVE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2009-06-11 US disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-7354693-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-04-08 US disclosed